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Constant temperature method and device for mask plate developing solution

A technology of constant temperature device and developing solution, which is applied in the direction of temperature control and photosensitive material processing by electric means, which can solve the problem of large temperature change of mask developing solution and achieve the effect of solving abnormal quality and improving precision and quality

Active Publication Date: 2011-10-05
深圳清溢光电股份有限公司
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  • Description
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Problems solved by technology

[0003] The object of the present invention is to provide a constant temperature device for mask developer, aiming to solve the problem of large temperature change of mask developer in the prior art

Method used

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  • Constant temperature method and device for mask plate developing solution
  • Constant temperature method and device for mask plate developing solution
  • Constant temperature method and device for mask plate developing solution

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Embodiment Construction

[0012] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0013] refer to figure 1 As shown, a mask developer solution constant temperature device provided by an embodiment of the present invention includes a first heat exchange system and a second heat exchange system, and the first heat exchange system includes a temperature controller 3 (temperature is controlled at 15~30±0.1°C), heat exchanger 4 (flow rate is controlled at 500~5000ml / m) and circulating water liquid pump 5, said heat exchanger 4 is connected with said thermostat 3 and circulating water respectively The liquid pump 5 communicates; the second heat excha...

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Abstract

The invention is applicable to the developing solution thermostatic technical field, and provides a thermostatic method of a mask developing solution. A first heat exchange system and a second heat exchange system are arranged, the first heat exchange system is used for refrigerating circulating water arranged in a water bath tank for accommodating a developing tank in a heat exchange way, and then the circulating water enters the second heat exchange system; the second heat exchange system causes the refrigerated circulating water to exchange heat with the developing solution in the developing tank, and the process is repeated in such way to cause the developing solution to stabilize at a desired temperature. The invention further provides a thermostatic device adopted by the thermostatic method, and the thermostatic device comprises the first heat exchange system and the second heat exchange system. The adopted thermostatic method of the mask developing solution and the thermostaticdevice solve the problem of unstable temperature of the mask developing solution, and meanwhile solve the problem of the mask quality abnormity caused by excessive impurities in the developing solution, thus improving the precision and quality of the mask.

Description

technical field [0001] The invention belongs to the technical field of constant temperature of developing solution, and in particular relates to a method and a constant temperature device for constant temperature of developing solution for a mask plate. Background technique [0002] The mask plate is a carrier for recording graphics and text information. Through exposure, development and other processes, the information of these graphics can be transferred to the chip. After the mask plate is exposed, in the process of developing, stopping, and fixing, due to the large temperature change of the developer, the uniformity and purification of the developer will be affected, resulting in the seam accuracy of the mask (that is, mask The deviation between the seam design value and the actual measurement value of the plate graphics) exceeds the standard, and it will also cause too many impurities to cause defects such as mildew spots and black spots on the mask plate. Contents of...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/30G05D23/19
Inventor 王金木
Owner 深圳清溢光电股份有限公司
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