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Substrate transfeering method and system and photolithography projector equipment

一种传送系统、衬底的技术，应用在微光刻曝光设备、光机械设备、光学等方向

Inactive Publication Date: 2009-05-27
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, an overlap error is introduced

Method used

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  • Substrate transfeering method and system and photolithography projector equipment
  • Substrate transfeering method and system and photolithography projector equipment
  • Substrate transfeering method and system and photolithography projector equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0036] figure 1 A lithographic apparatus according to an embodiment of the present invention is schematically shown. The equipment includes:

[0037] an illumination system (illuminator) IL configured to condition a radiation beam B (eg, ultraviolet (UV) radiation or extreme ultraviolet (EUV) radiation);

[0038] a support structure (e.g. a mask table) MT configured to support a patterning device (e.g. a mask) MA and connected to a first positioning device PM configured to precisely position the patterning device according to determined parameters;

[0039] A substrate holder, such as a substrate table (e.g., a wafer table) WT, is configured to hold a substrate (e.g., a resist-coated wafer) W and is configured to precisely position the substrate according to determined parameters. the second positioning device PW is connected; and

[0040] A projection system (e.g. a refractive projection lens system) PS configured to project the pattern imparted to the radiation beam B by ...

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PUM

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Abstract

The present invention relates to a method for transferring a substrate, a transfer system and a lithographic projection apparatus. The method transfers a substrate from a first substrate holder, e.g., a pre-alignment unit, to a second substrate holder, e.g., a substrate table in a lithographic apparatus, by means of a transfer unit on the basis of transfer data available thereto. First, the substrate is provided on the first substrate holder. Subsequently, a position error of the substrate is measured, and positioning adjustment data are calculated based on the position error as measured. Then, the second substrate holder is moved relative to a reference position thereof in accordance with the positioning adjustment data. Finally, the substrate is transferred by means of the transfer unit from the first substrate holder to the second substrate holder in accordance with the transfer data, and placed on the second substrate holder as moved.

Description

technical field [0001] The present invention relates to a method of transferring a substrate from a first substrate holder to a second substrate holder on the basis of valid transfer data by employing a transfer unit and a computer program coded with computer executable code enabling it to perform the aforementioned method. Read media. The present invention also relates to a transport system for transporting substrates based on transport data, a lithographic projection apparatus comprising the transport system, a method of manufacturing a device using the lithographic projection apparatus and making it possible to execute the aforementioned device A computer-readable medium encoded with computer-executable code for a method of manufacture. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of in...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20H01L21/677
CPCG03F7/70725H01L21/67265G03F9/7011H01L21/67745G03F7/70783G03F7/70775G03F7/70633G03F7/70733G03F7/70508G03F7/706835G03F7/7085G03F7/707
Inventor J·A·M·阿尔贝蒂G·P·M·范努恩F·E·格伦斯密特R·T·P·孔佩
Owner ASML NETHERLANDS BV
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