Method and device for preparing silicon nanoparticles by utilizing plasma body

Abstract

The invention discloses a method and a device for preparing silicon nanoparticles by utilizing a plasma body. The method comprises the following steps: introducing mixed gas containing a silicon-containing air source and inert gas into a plasma body cavity; exciting the gas in the plasma body cavity to make the silicon-containing air source converted into the silicon nanoparticles; and collectingthe silicon nanoparticles by the collection device after the silicon nanoparticles are taken out of the plasma body cavity by air current. The method can use the high-power plasma body in the processof preparing the silicon nanoparticles, simultaneously avoids depositing the silicon nanoparticles on the inner wall of the plasma body cavity, and improves the collection of the silicon nanoparticlesin a gas phase. The method and the device ensure that the preparation of the silicon nanoparticles meets the requirements of large-scale production.

Description

Method and device for preparing silicon nanoparticles by plasma technical field The invention relates to the technical field of nanometer materials, in particular to a method and a device for preparing silicon nanoparticle by using radio frequency or microwave plasma. Background technique Silicon nanoparticles have very broad application prospects in the fields of electronics, optoelectronics, photovoltaics and biomedicine. On the one hand, they can be easily integrated into traditional device manufacturing processes to enhance the functions of traditional devices; on the other hand, they greatly promote the generation of new processes and new devices. For example, printed electronics based on silicon nanoparticles will profoundly change the manufacturing process of silicon devices and greatly reduce the cost of various silicon devices such as transistors and solar cells. As we all know, bulk monocrystalline silicon is the foundation of the large-scale integrated circuit ...

AI Technical Summary

Problems solved by technology

Although the productive rate of gas phase method can reach 0.2 gram / hour (Li et al., Process for preparing macroscopic quantities of brightly photoluminescent silicon nano particles with mission spanning the visible spectrum, Langgmuir19 (2003), 8490-8496), this still has a big gap with the requirement of industrialized production

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