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Low thermal effect projection objective

A technology of projection objective lens and thermal effect, which is applied in the field of optical systems, can solve the problems of impact, low thermal conductivity of optical materials, convection and density changes of the surrounding air medium, and does not consider the elimination of lens and lens holder stress, etc., so as to reduce adverse effects Effect

Inactive Publication Date: 2009-11-04
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the elimination of stress between the lens and the lens holder caused by thermal effects is not considered in the prior art
[0007] In addition, the thermal conductivity of the optical material itself is not high, the convection and density changes of the surrounding air medium will also have an impact

Method used

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Embodiment Construction

[0024] The thermal effect characteristics of the lens are characterized by the lens life / thermal effect sensitivity coefficient:

[0025] K LT / LH = D D > ( CA > CA ) 2 Formula 1

[0026] Among them, D represents the thickness of a single lens, CA represents the effective aperture of a single lens, Indicates the average central thickness of N lenses, Indicates the average light aperture of N lenses.

[0027] Projection objective lens according to the present invention is by thermal effect sensitivity coefficient K LT / LH Different lens composition.

[0028] The image quality change caused by thermal effects is mainly reflec...

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Abstract

The invention provides a low thermal effect projection objective. The projection objective consists of lenses with different low thermal effect sensitivity coefficients KLT / LH, and the lens with higher KLT / LH consists of materials with smaller thermal effect property, wherein the thermal effect sensitivity coefficient KLT / LH is equal to (D / ) ( / CA); D expresses the thickness of a single lens; CA expresses the effective light pass caliber of each lens; expresses average center thickness of N lenses; and expresses average light pass caliber of the N lenses. The lens selects the material with small thermal effect property according to the thermal effect sensitivity coefficient of the lens, and the adverse effect of the thermal effect on a projection optical system is reduced.

Description

technical field [0001] The invention relates to an optical system, in particular to a total refraction projection optical system. Background technique [0002] At present, in the field of semiconductor packaging, the demand for micron-level resolution and high-yield projection optical systems is increasing, and the objective lens with a larger working distance will bring convenience to the positioning of masks and silicon wafers and the design of transmission structures. [0003] From ultraviolet to deep ultraviolet bands, projection objectives are troubled by lens heating. The thermal effect of the projection objective usually causes the thermal expansion of the lens material and the temperature change of the refractive index of the lens material. These two factors are factors that must be considered in optical design. While the thermal effect heats up the lens as a whole, it also produces a radial temperature difference distribution. The uniform temperature change of th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B13/00G02B1/00G03F7/20G02B27/00
Inventor 武珩
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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