Low thermal effect projection objective

A technology of projection objective lens and thermal effect, which is applied in the field of optical systems, can solve the problems of impact, low thermal conductivity of optical materials, convection and density changes of the surrounding air medium, and does not consider the elimination of lens and lens holder stress, etc., so as to reduce adverse effects Effect

Inactive Publication Date: 2009-11-04
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF0 Cites 19 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the elimination of stress between the lens and the lens holder caused by thermal effects is not considered in the prior art
[0007] In addition, the thermal conductivity of the optical material itself is not high, the convection and density changes of the surrounding air medium will also have an impact

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Low thermal effect projection objective
  • Low thermal effect projection objective
  • Low thermal effect projection objective

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] The thermal effect characteristics of the lens are characterized by the lens life / thermal effect sensitivity coefficient:

[0025] K LT / LH = D D > ( CA > CA ) 2 Formula 1

[0026] Among them, D represents the thickness of a single lens, CA represents the effective aperture of a single lens, Indicates the average central thickness of N lenses, Indicates the average light aperture of N lenses.

[0027] Projection objective lens according to the present invention is by thermal effect sensitivity coefficient K LT / LH Different lens composition.

[0028] The image quality change caused by thermal effects is mainly reflec...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a low thermal effect projection objective. The projection objective consists of lenses with different low thermal effect sensitivity coefficients KLT/LH, and the lens with higher KLT/LH consists of materials with smaller thermal effect property, wherein the thermal effect sensitivity coefficient KLT/LH is equal to (D/) (/CA); D expresses the thickness of a single lens; CA expresses the effective light pass caliber of each lens; expresses average center thickness of N lenses; and expresses average light pass caliber of the N lenses. The lens selects the material with small thermal effect property according to the thermal effect sensitivity coefficient of the lens, and the adverse effect of the thermal effect on a projection optical system is reduced.

Description

technical field [0001] The invention relates to an optical system, in particular to a total refraction projection optical system. Background technique [0002] At present, in the field of semiconductor packaging, the demand for micron-level resolution and high-yield projection optical systems is increasing, and the objective lens with a larger working distance will bring convenience to the positioning of masks and silicon wafers and the design of transmission structures. [0003] From ultraviolet to deep ultraviolet bands, projection objectives are troubled by lens heating. The thermal effect of the projection objective usually causes the thermal expansion of the lens material and the temperature change of the refractive index of the lens material. These two factors are factors that must be considered in optical design. While the thermal effect heats up the lens as a whole, it also produces a radial temperature difference distribution. The uniform temperature change of th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02B13/00G02B1/00G03F7/20G02B27/00
Inventor 武珩
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap