Method and device thereof for linearly cutting silicon slice

A wire cutting and silicon wafer technology, which is used in sawing machine devices, fine working devices, metal sawing equipment, etc., can solve the problems of large thickness deviation, waste of slice thickness, and different thicknesses, so as to improve the quality of slices and improve the quality of slices. Quantity, the effect of increasing the number and quality of slices

Active Publication Date: 2010-01-06
SHANGHAI JINGMEI ELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the reduction of the diameter of the steel wire, the loss of the slit becomes smaller, and the less cut part is added to the thickness of the slice. Compared with the slice, the thickness of the slice must gradually decrease with the gradual reduc

Method used

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  • Method and device thereof for linearly cutting silicon slice
  • Method and device thereof for linearly cutting silicon slice
  • Method and device thereof for linearly cutting silicon slice

Examples

Experimental program
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Effect test

Example Embodiment

[0031] The present invention is a device for implementing the above silicon wafer wire cutting method, which is figure 2 with image 3 On the basis of the device shown, the guide wheel is mainly improved to adapt it to the requirement of wire mesh encryption. The device mainly includes a guide wheel 1 with a wire slot, and a steel wire mesh 2 wound on the guide wheel 1. The slot distance on the guide wheel 1 is originally equidistant. The main feature of the present invention is that the guide wheel The slot pitch on 1 is changed to an unequal slot pitch. The unequal slot pitch starts from the steel wire winding guide wheel and decreases sequentially along the length of the guide wheel, so that the winding is wound on the guide wheel. The wire mesh on the wheel trunking is gradually dense. There are two implementation methods for the unequal slot pitch on the guide wheel:

[0032] In the first embodiment, the unequal slot pitch on the guide wheel 1 is along the length of the gu...

Example Embodiment

[0035] Example one

[0036] Such as Figure 4 As shown, the slot pitch on the guide wheel 1 is unequal. It is divided into three unequal slot pitches along the length of the guide wheel. The slot pitch on the two adjacent sections is from steel The first section of the wire wound on the guide wheel 1 begins to decrease sequentially, and there are several wire grooves with equal slot pitch on each section. Such as Figure 4 As shown, in the length direction of the guide wheel 1, it is divided into three unequal slot pitches according to the slot length L1, that is, the slot pitch of the first section A>the slot pitch of the second section B> The slot pitch of the third section C. The slot pitches on the first section A, the second section B, and the third section C are respectively equal.

[0037] Based on the above technical features, the applicant has made improvements on the following types of silicon wafer wire cutting devices:

[0038] A. Existing Swiss MEYER BURGER DS265 guid...

Example Embodiment

[0045] Example two

[0046] Such as Figure 5 As shown, the slot pitch on the guide wheel 1 is unequal. It is divided into 8 unequal slot pitches along the length of the guide wheel. The slot pitch on the two adjacent sections is made from steel The first section of the wire wound on the guide wheel 1 begins to decrease sequentially, and there are several wire grooves with equal slot pitch on each section.

[0047] Based on the above technical features, the applicant has made improvements on the following types of silicon wafer wire cutting devices:

[0048] A. Existing Swiss MEYER BURGER DS264 guide wheel groove pitch structure:

[0049] Slotting length L2 = 820mm, the total number of slots is 2448, and the slot pitch is 0.335mm.

[0050] B. Increase the number of slots after improvement:

[0051] Using Swiss MEYER BURGER DS264 machine, under the condition of slotting length L2=820mm, please refer to Figure 5 , The grooving method is divided into 8 sections of grooving, and the groo...

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PUM

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Abstract

The invention discloses a method and a device thereof for linearly cutting a silicon slice. By repeatedly and sequentially winding a steel wire on two or four guide wheels provided with wire casings, a steel wire gauze is formed, and a monocrystalline silicon rod is processed by ground finish. By utilizing the principle that the diameter of the steel wire becomes smaller and smaller along with the abrasion in a cutting process, a method that the steel wire which is winded on the guide wheel is sequentially and gradually thickened when winded on the guide wheel is adopted, so that the monocrystalline silicon rod can be processed by ground finish; and to this end, the slotting pitches of the guide wheel are changed to be unequal, and the unequal slotting pitches are sequentially reduced along the length direction of the guide wheel from the beginning that the steel wire is winded on the guide wheel, so that the gradual thickening degree of the steel wire gauze can compensate the increased thickness of the cut silicon slice caused by the reduced diameter of the steel wire after abrasion, and the monocrystalline silicon rod is cut into hundreds of completely identical silicon slices by cutters time after time. Under the circumstance that the slotting length of the invention is identical with the existing slotting length of the guide wheel, the quantity of the cut silicon slices is increased correspondingly, thereby enabling the economic benefit to be outstanding.

Description

Technical field [0001] The invention relates to a silicon single crystal rod slicing process, in particular to a silicon wafer wire cutting method and a device for processing silicon slices by using a wire cutting system. Background technique [0002] At present, most of the small diameter silicon single crystal rods are still cut by an inner circle slicer, whose blade is embedded on the inner circumference of a circular metal thin substrate, and the outer circle of the blade is fixed on the rotating shaft. Compared with the outer circular blade type slicer used earlier, it can use a thinner blade (depending on the diameter required to be processed, the appropriate cutter head and blade can be selected, for example, the cutting diameter of 200mm silicon single crystal rod needs to be used The 34in blade has a blade thickness of about 380μm, and the thickness of the metal substrate of the blade is less than 200μm), so it can cut thinner wafers with relatively small cutting consump...

Claims

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Application Information

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IPC IPC(8): B24B27/06B28D5/04
CPCB28D5/045B23D57/0053
Inventor 周俭
Owner SHANGHAI JINGMEI ELECTRONICS TECH CO LTD
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