Device and method for etching optical glass

Abstract

The invention discloses a device and a method for etching optical glass. When the glass of large size is etched and / or thinned, the device and the method are used for uniformly etching and / or thinning the optical glass in a driveline mode with inclination to reduce the stress of the optical glass and uniformly releasing an etching solution by adopting a scan-type waterfall layer sulfuric acid solution coating mode and a moving mode of scanning back and forth and / or left and right from the upside of the optical glass so as to uniformly etch and thin the optical glass. When the optical glass etching device of the invention is used for carrying out the optical glass etching method, because the optical glass is inclined, the limitation of the mechanical strength and the physical properties of the glass are reduced in conveying and transmission and the problems caused when the glass is vertically conveyed and transmitted are avoided; and due to the fact that the optical glass is coated with the sulfuric acid solution in a way of scanning type waterfall layer, the etching speed can be increased and the etching uniformity of the optical glass can be enhanced.

Description

technical field [0001] The invention relates to an etching device and method, in particular to an optical glass etching device and method for etching and / or thinning large-size glass. Background technique [0002] Under the trend of lightweight, thin, wide viewing angle and high brightness of liquid crystal displays, liquid crystal manufacturers have proposed thinning methods for different components, especially the glass substrate, which occupies a large volume, is the main focus of manufacturers. Target. [0003] In order to thin the glass substrate, various manufacturers have proposed several methods, which can be roughly divided into vertical soaking of multiple sheets, horizontal spraying of single sheet, and vertical spraying of single sheet. Regardless of the method, chemical solutions, such as hydrogen fluoride solutions, are used to etch the glass substrate isotropically, using etching time and other control methods to gradually thin the glass substrate, and then c...

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Problems solved by technology

[0010] The main purpose of the present invention is to provide an optical glass etching device and method to solve the difficulty of thinning manufacturing of multi-piece upright immersion, the surface of the glass substrate is easy to react and attach again, and the original etching solution and reaction products are left in the chemical tank. The problems caused by the accelerated etching rate of the interior and both ends of the glass substrate; and solve the surface vortex of the glass substrate, poor glass uniformity, slow flux, and the difficulty in controlling the spraying area and force of the single horizontal spraying. It also solves the problems caused by grinding again after etching and thinning; it also solves the vortex shape caused by the uneven force on the surface of the single-piece vertical sprayed glass substrate, the glass is not easy to be completely vertically fixed, and the glass is easy to fall, and the etching is uneven. The problem

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