Oligomer and thermosetting photosensitive resin composition
A photosensitive resin, oligomer technology, applied in optics, optomechanical equipment, instruments, etc., can solve the problems of poor adhesion or flexure of solder mask ink to substrate and circuit
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Embodiment 1-7
[0030] Embodiment 1-7: preparation of photosensitive resin composition
[0031] The above-mentioned diol-based modified product (T1), cresol epoxy resin modified product (C1), bisphenol A epoxy resin modified product (C2) and novolac epoxy resin modified product (C3) according to Table 1 Mix and stir in the mixing ratios shown.
[0032] Table 1: Oligomers used in Examples and Comparative Examples
[0033]
[0034] Then, add photoinitiator respectively: 2-methyl-1-[4-(methylthio) phenyl]-2-morpholino propane-1-ketone (Irgacure 907, Ciba Company produces) 40g, 2-iso Prothioxanthone (ITX) 10 g, photosensitive monomer (pentaerythritol hexaacrylate) 50 g, defoamer (KS-66, manufactured by Shinetsu Corporation) 10 g, catalyst: melamine 10 g and (dicyandiamide (Dicy)) 1 g, and Additives: barium sulfate (B30, produced by Sakai company) 31.4g, silicon dioxide (R-972, produced by Degusa company) 40g and green colorant (phthalocyanine green) 3g, and put into three-roller grinder grin...
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