Method for measuring focal plane uniformity of exposure machine
A focal plane and uniformity technology, which is applied in the field of measurement of the focal plane uniformity of exposure machines in semiconductor manufacturing, can solve the problems of less sampling, insufficient representation, and low measurement efficiency, so as to improve efficiency, sensitivity and accuracy , Overcome the single effect of graphics
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[0029] The following describes the implementation of the present invention through specific specific examples in conjunction with the accompanying drawings. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific examples, and various details in this specification can also be based on different viewpoints and applications, and various modifications and changes can be made without departing from the spirit of the present invention.
[0030] figure 2 It is a flowchart of a method for measuring the uniformity of the focal plane of an exposure machine according to the present invention. The method of the present invention for measuring the uniformity of the focal plane of an exposure machine includes the following steps:
[0031] First, make a special reticle. The pattern area of the reticle is design...
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