Method of parallel run of reaction furnace for moisture generation

Abstract

In the event of meeting demands for an increase of the amount of high-purity water fed through parallel run of multiple reaction furnaces for moisture generation, simplification of mixed gas (raw gas)distributor and marked reduction of equipment cost are attained by realizing of the distribution supply of H2 and O2 mixed gas with the use of very simple orifice. Accordingly, there is provided a method of parallel run of reaction furnaces for moisture generation, comprising disposing an orifice with bore of given diameter on the mixed gas entrance side of each of parallelly connected multiple reaction furnaces for moisture generation so that not only is hydrogen / oxygen mixed gas (G) from a mixing unit fed through the orifice to each of the reaction furnaces for moisture generation but alsothe moistures generated by the individual reaction furnaces for moisture generation are joined together and fed to high-purity water using apparatus.

Description

technical field [0001] The present invention relates to a method for parallel operation of reaction furnaces for generating moisture, which is used, for example, in semiconductor manufacturing equipment and chemical manufacturing equipment. By inserting a hole member having an appropriate diameter into each raw material gas supply line of the reaction furnace for moisture generation, it is possible to stably operate the reaction furnaces for moisture generation in parallel with a predetermined amount of water generation. Background technique [0002] In the additional treatment of silicon oxide film by the moisture oxidation method of semiconductor manufacturing equipment, etc., it is necessary to supply high-purity water, and usually, such as Figure 8 As shown, the required high-purity water is supplied using a reaction furnace for water generation. [0003] That is, the reaction furnace for generating moisture is as disclosed in International Publication No. WO97 / 28085 an...

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Problems solved by technology

[0015] The present invention is to solve the above-mentioned problem in the supply equipment of high-purity water using the conventional reaction furnace for water generation, that is, to respond to the amount of water supplied by increasing the size (or capacity) of the reaction furnace for water generation Due to the increased requirements of the platinum-coated catalyst membrane, the increase in the size of the reactor for moisture generation is limited due to the structural aspects such as the durability of the platinum-coated catalyst film, so there is a problem of certain restrictions; When supplying the mixed gas G from the mixed gas split supply device to a plurality of production reactors operating in parallel to respond to the increase in the amount of water supplied, not only the equipment cost and management cost of the mixed gas G split supply device will be incurred The increase of height, and the problem of needing a large installation space; and other problems, the main purpose of the invention is to provide a method for parallel operation of the reaction furnaces for water generation, which does not require a complicated flow distribution device for the mixed gas G. An orifice member with a predetermined inner diameter is provided in the center of the mixed gas supply line of each moisture generating reactor operating in parallel, and a predetermined amount can be supplied inexpensively and accurately to each moisture generating reactor operating in parallel with a simple mechanism. The mixed gas G, which can easily respond to the increase in the amount of moisture generation

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