Unlock instant, AI-driven research and patent intelligence for your innovation.

Method and device for forming line used for cutting

A technology of predetermined lines and substrates, applied in laser welding equipment, electrical components, circuits, etc., can solve problems such as difficulty in ensuring depth, and achieve the effects of reliable formation, thermal influence suppression, and low cost

Inactive Publication Date: 2013-01-09
ORMON CORP
View PDF1 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] However, in the above-mentioned method of forming a scribing line for cutting using a pulsed laser beam, although thermal influence can be minimized, conversely, in order to form a sufficiently deep scribing line, the power of the laser beam still needs to be greatly increased. If the thermal influence on the device circuit is considered, there is still a problem that it is difficult to ensure sufficient depth.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and device for forming line used for cutting
  • Method and device for forming line used for cutting
  • Method and device for forming line used for cutting

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0131] According to the experiment of the present inventors, in the first step (forming the pulsed laser irradiation line 10), the moving speed of the optical axis passing through the XY table mechanism is set to 100mm / s, and the output of the pulsed laser beam 31 is set to 20W. (repetition frequency 50kHz), when the moving speed of the optical axis passing through the XY table mechanism in the second step (forming the CW laser irradiation line 11) is set to 40mm / s, and the output of the CW laser is set to 20W, it is possible to obtain The depth of the line. Considering that the depth of the scribing line obtained by the conventional method using only a single laser (CW laser) is about 50 μm, it has been confirmed that the scribing line can be 4 to 5 times thicker than the conventional one in the present invention. depth.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention provides a method and a device for forming a line used for cutting. The line with enough depth for cutting off the substrate can be formed on a more transparent substrate with low energy absorbing efficiency without thermal damage to a device substrate inlayed wherein. The method of the invention comprises the following steps: a first step, through relatively moving a pulse-shaped laser beam through performing Q switch driving to the substrate and a laser oscillator, only irradiating the pulse-shaped laser beam to a preset fine interval which sets the substrate edge on apreset cutting-off line on the substrate to one end; and a second step, through relatively moving the CW laser beam obtained by continuously driving the substrate and the laser oscillator, irradiating the CW laser beam to all intervals from one substrate edge to the other substrate edge on the preset cutting-off line that is set on the substrate.

Description

technical field [0001] The present invention relates to irradiating a transparent substrate (substrate) embedded with a device circuit with a laser beam of a predetermined wavelength generated from a laser oscillator, while moving the substrate relative to the beam, thereby forming a substrate cut on the substrate Methods and devices for scribing. Background technique [0002] Conventionally, in order to divide a substrate (wafer: wafer) embedded with a plurality of device circuits vertically and horizontally into individual circuit chips (chips), a method has been adopted in which scribe lines are formed in advance along planned dividing lines on the substrate. , the substrate is cut along the scribe line using a cutting device such as an expander. [0003] At this time, if a machining method using a cutter or the like is used to form the scribed line, particles will be generated to hinder the subsequent steps. Therefore, the following method has been used in the past. A ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B23K26/06B23K26/00B23K26/08B23K26/364
CPCB23K26/062H01L21/67092H01L21/78
Inventor 松本吉信
Owner ORMON CORP