Power AlGaN/GaN Schottky diode and manufacturing method thereof
A technology of Schottky diode and manufacturing method, which is applied in semiconductor/solid-state device manufacturing, electrical components, electrical solid-state devices, etc., can solve the problems of inconvenient parallel packaging of multiple device units and heat dissipation, so as to improve heat dissipation performance, increase Effective area effect
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Embodiment 1
[0034] as attached figure 1 As shown, the structure of the power type AlGaN / GaN Schottky diode in the present invention is shown, and only the structures of two adjacent device units are shown here, which include: from bottom to top, low resistance n-type Si substrate layer 6, a buffer layer 5 composed of an AlN single-layer structure or a multi-layer structure formed of AlGaN and AlN, a GaN layer 4, an AlGaN layer 3, and a gate 1 arranged on the AlGaN layer 3; the GaN A heterojunction two-dimensional electron gas conduction channel 11 is formed between the layer 4 and the AlGaN layer 3 thereon, and the power AlGaN / GaN Schottky diode utilizes the AlGaN / GaN heterojunction two-dimensional electron gas conduction channel to The transport current, high electron concentration and high electron mobility of the two-dimensional electron gas can effectively reduce the on-resistance of the device.
[0035] In addition, it also includes a sinker hole structure 9 arranged on the surface ...
Embodiment 2
[0038] as attached figure 2 As shown, it is another structural schematic diagram of the power type AlGaN / GaN Schottky diode of the present invention. The structure in this embodiment is basically the same as that in Embodiment 1, except that the sinker hole structure 9 is formed from the AlGaN The surface of layer 3 extends to a position inside the Si substrate layer 6 to minimize the on-resistance.
Embodiment 3
[0040] as attached image 3 As shown, it is a schematic diagram of another structure of the power type AlGaN / GaN Schottky diode of the present invention. The structure in this embodiment is basically the same as that of Embodiment 1, the difference is that the contact between the gate 1 and the AlGaN layer 3 A passivation layer 8 is also provided between the edges, and the material of the passivation layer is SiOx or Al 2 o 3 or Si 3 N 4 . It is used to suppress the edge effect of the electric field and increase the breakdown voltage.
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