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Method for drawing vector character in LEdit

A character and vector technology, applied in the field of mask design in microfabrication, can solve the problems of cumbersome steps, troublesome, unable to output character information, etc., and achieve the effect of large character selection space and strong flexibility

Active Publication Date: 2011-08-31
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, in the currently known methods, the mask drawing software LEdit cannot intelligently input character information at one time. In the past, the method for realizing character input was to first display the characters in CAD through other software, and then use third-party software Convert CAD information into GDSII information that LEdit can recognize, and finally import it by LEdit
These methods are cumbersome to use, the steps are cumbersome, and the required character information cannot be quickly output at the specified position, and the user needs to purchase multiple software at the same time, which increases the design cost of the mask.

Method used

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  • Method for drawing vector character in LEdit
  • Method for drawing vector character in LEdit
  • Method for drawing vector character in LEdit

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Embodiment Construction

[0025] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0026] The method for drawing vector characters in LEdit provided by the present invention first converts character information into dot matrix information, then converts dot matrix information into vector information, and finally draws them in LEdit. This method can greatly reduce the workload of character drawing in the mask drawing process.

[0027] like figure 1 as shown, figure 1 It is a flow chart of a method for drawing vector characters in LEdit provided by the present invention, and the method specifically includes the following steps:

[0028] Step 101: Obtain the location and system information of the user's drawing, and convert the obtained information into logical coordinate information;

[0029] Step 102:...

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Abstract

The invention discloses a method for drawing a vector character in LEdit, which comprises the following steps: acquiring the position drawn by the user and system information, and converting the acquired information into logical coordinate information; acquiring character information which the user needs to draw, mapping the character information into the logical memory, and converting the character information into bitmap information; acquiring dotmatrix information of the bitmap information from the logical memory, and memorizing the dotmatrix information according to the save protocols; and calling the interface provided by LEdit, analyzing the dotmatrix information memorized according to the save protocols, and outputting the drawn vector character in LEdit. The method for drawing a vector character in LEdit is fast, precise, simple and convenient, and can save a lot of time for designing the mask.

Description

technical field [0001] The invention relates to the technical field of mask plate design in microfabrication, in particular to a method for drawing vector characters in LEdit. Background technique [0002] For more than half a century, tremendous changes have taken place in the semiconductor and microfabrication industry, and its feature size has entered submicron and nanometer levels. With the further deepening of social information and the urgent needs of economic development, integrated circuits and microfabrication Enter a new development climax. Therefore, the shape and structure of new devices have also undergone many changes, which puts forward higher requirements for mask design. However, the traditional method of manually drawing mask is facing more and more complex mask design. It seems to be more than enough and not enough. Fast and accurate design and drawing of masks has always been the pursuit of this field. For the purpose of saving time, reducing manpower a...

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Application Information

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IPC IPC(8): G06F17/50
Inventor 刘明柳江姬濯宇陈宝钦
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI