Methods for controlling coating gloss

A gloss and coating technology, applied in the direction of coating, the process for producing decorative surface effects, and patterns characterized by light projection effects, can solve the problems of time-consuming and cost, achieve low gloss and improve flow performance , good transparency effect
CN101743069AInactive Publication Date: 2010-06-16VALSPAR SOURCING INC
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
VALSPAR SOURCING INC
Publication Date
2010-06-16
Estimated Expiration
Not applicable · inactive patent
Patent Text Reader

Abstract

A method including applying a coating composition on a substrate to form a coating, wherein the coating has a first surface roughness; transferring a pattern to the coating to form a patterned coating, wherein the patterned coating has a second surface roughness different from the first surface roughness; and curing the patterned coating to form a cured coating with a desired level of gloss.
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Description

technical field

[0001] The present invention relates to a method for imparting a specified gloss level to a coating on an article. Background technique

[0002] The final gloss of a coating such as a 100% solids UV curable topcoat depends on a number of parameters that are difficult to control. For example, properties of the coating solution itself, such as resin binder used in the formulation, formulation viscosity, and matting pigment content, can have an impact on the final gloss level of the topcoat. In addition, curing conditions, such as curing speed, temperature, and oxygen inhibition, have an impact on the gloss of the final coated product. In order to achieve an extremely low gloss finish, the coating solution typically has an extremely high content of matting pigments to roughen the surface of the cured coating. However, this higher pigment content also reduces the flow properties of the coating solution.

[0003] Furthermore, conditions in a production facility...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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