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Polishing pad with abrasive grains and manufacturing method thereof

A manufacturing method and technology of abrasive grains, which are applied in the direction of manufacturing tools, abrasives, metal processing equipment, etc., can solve problems such as scratches, severe, large areas, etc.

Active Publication Date: 2013-07-17
BESTAC ADVANCED MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The polishing pad 1 with abrasive grains uses resin 121 to fix the abrasive grains 122, so the abrasive grains 122 are fixed at the same position during polishing, and are ground in the same direction with the same stress, which is easy to cause scratches on the polished workpiece
At the same time, the resin 121 is gradually worn away, so that the abrasive particles 122 fixed in the resin 121 are exposed to an increasing area of ​​the polishing surface 1211, resulting in more serious scratches.

Method used

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  • Polishing pad with abrasive grains and manufacturing method thereof
  • Polishing pad with abrasive grains and manufacturing method thereof
  • Polishing pad with abrasive grains and manufacturing method thereof

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example

[0035] The manufacturing method of this example corresponds to the manufacturing method of the above-mentioned second embodiment. refer to Figure 6 , first, fiber raw material and a plurality of abrasive grains 32 are provided, and the abrasive grain 32 is added to the fiber raw material, wherein the fiber raw material comprises 75% by weight of polyethylene terephthalate and 40% by weight of polyethylene, the abrasive grain 32 is 3% by weight silica.

[0036] Next, a spinning step is performed to form the fiber raw material into a plurality of fibers 31 . Fiber 31 is solid, and part abrasive grain 32 is positioned at the inside of fiber 31, and part abrasive grain 32 is exposed on the surface of fiber 31 (as Figure 7 shown). The spinning step is melt spinning. First, the fiber raw material is melted at a temperature of 288°C through an extruder, sprayed out from a spinneret, and then cooled at a temperature of 22°C. The spinning speed is 550m / min. The raw silk is obtain...

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Abstract

The invention relates to a polishing pad with abrasive grains and a manufacturing method thereof; the polishing pad with polishing pad comprises a plurality of fibers, a plurality of abrasive grains and a macromolecule body; the fibers are staggered and arrayed into a fiber base material, and the abrasive grains are attached to the fibers, and the fibers and the abrasive grains are covered by themacromolecule body; the flexibility of the fiber leads the abrasive grains not to scratch the surface of a polishing workpiece.

Description

technical field [0001] The invention relates to a polishing pad and a manufacturing method thereof, in particular to a polishing pad with abrasive grains and a manufacturing method thereof. Background technique [0002] The conventional polishing method adopts the mode of polishing liquid and polishing pad. There are a plurality of abrasive grains in the polishing liquid, and the abrasive grains are used to polish the surface of the workpiece to be polished. The polishing pad has a plurality of holes, and each hole is connected to each other, so that the polishing liquid is evenly distributed on the surface of the polishing pad, thereby improving the polishing ability. [0003] The disadvantages of conventional polishing methods are as follows. When polishing, when the polishing liquid flows in the holes, the abrasive particles in the polishing liquid are easy to block the holes, resulting in a decrease in the polishing ability. Then you need to use a trimmer to trim the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B24D11/00
Inventor 冯崇智姚伊蓬洪永璋蔡坤成林至逸
Owner BESTAC ADVANCED MATERIAL
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