Total dose radiation hardening I-shaped gate layout structure
A technology of total dose radiation and layout structure, applied in electrical components, transistors, circuits, etc., can solve the problems of difficult large-scale integrated circuits, increase circuit parasitic capacitance, occupy large chip area, etc., achieve good radiation resistance performance, reduce Area, easy to reinforce effect
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[0037] Below in conjunction with accompanying drawing and specific embodiment the present invention is described in further detail:
[0038] Such as Figure 6 Shown is a plan view of the total dose radiation reinforced I-shaped gate layout of the present invention, including an active region 60, a field oxygen region 62 outside the active region 60, and an I-shaped gate 65 overlapping the active region 60. The portion of the source region 60 that does not overlap with the I-shaped gate 65 is divided into a source region 64 and a drain region 66, wherein the I-shaped gate 65 is in the shape of an "I" and is divided into a region, b region and c region, and the active region 60 , the source region 64 and the drain region 66 are rectangular, and the I-shaped gate 65 of the entire area where the active region 60 and the I-shaped gate 65 overlap (area a and b in the figure) is a gate oxide layer (i.e. the active region 60 and the I-shaped gate 65 are provided with a gate oxide lay...
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