Device for manufacturing thin film by liquid phase epitaxial method
A liquid phase epitaxy and thin film technology, applied in liquid phase epitaxy layer growth, chemical instruments and methods, crystal growth and other directions, can solve problems such as uneven growth, affect product quality, and cannot meet industrial production, achieve uniform thickness, eliminate Uneven temperature field, avoid the effect of throwing out
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[0026] Such as figure 1 and figure 2 As shown, a device for liquid phase epitaxial film growth includes: a valve chamber 9, a door 91 is arranged on one side of the valve chamber 9, and is used for entering and exiting the graphite flower basket; There is a furnace chamber 5 below, and the furnace chamber 5 is covered by a furnace cover 4; a graphite crucible 9 is arranged in the furnace chamber 5, and the graphite crucible is used to accommodate a quartz crucible (not shown in the figure), and the quartz crucible is used for dissolving the alloy solvent; the graphite crucible There is a graphite heater 8 outside for heating the graphite crucible; the graphite heater 8 is connected to the electrode 7 . A lifting rotating shaft 1 is installed in the valve chamber 9 and the auxiliary chamber 2, and a graphite flower basket 3 is connected to the lifting rotating shaft 1 (see image 3 ), the graphite flower basket 3 can be immersed or raised in the quartz crucible. The graphit...
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