Two-translational-motion precision positioning working table for nano-imprint photoetching system

A photolithography system and precise positioning technology, applied in the field of micro-operating systems, can solve the problems of uneven distribution of imprinting force, limitation of processing accuracy and quality, and easy stretching and deformation of silicone, so as to achieve micro-feeding and precise positioning, eliminating Nonlinear, assembly-free effects

Active Publication Date: 2010-07-07
江苏金秋刺绣花边有限公司
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AI Technical Summary

Problems solved by technology

Among these existing technologies, although the self-adaptive adjustment precision positioning system is simple in structure, compact in structure and low in cost, its positioning accuracy, especially the adjustment accuracy of parallelism is low, which limits the improvement of processing accuracy and quality
Although the parallelism between the imprint template and the substrate can be improved to a certain extent through active leveling and manual adjustment mechanisms, it cannot compensate for the parallelism error between the template and the substrate due to uneven imprint force during the imprinting process
The airbag cylinder type imprinting system overcomes the disadvantages that the silicone is easily stretched and deformed during the imprinting process, the imprinting force is unevenly distributed, and the template is easy to break. However, the design and use of the vacuum chamber is expensive and the imprinting time is too long.

Method used

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  • Two-translational-motion precision positioning working table for nano-imprint photoetching system
  • Two-translational-motion precision positioning working table for nano-imprint photoetching system
  • Two-translational-motion precision positioning working table for nano-imprint photoetching system

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Embodiment Construction

[0019] The specific embodiments, structures, features, and effects provided by the present invention are described in detail below with reference to the drawings and preferred embodiments.

[0020] See Figure 1~4 , A two-translation precision positioning table for nanoimprint lithography system. This workbench ( image 3 ) There are four piezoelectric ceramic actuators 11, and a spherical joint 10 is installed on the top. The spherical joint 10 contacts the moving block 3 in a small area Hertz contact mode. The piezoelectric ceramic actuator 11 is placed horizontally. In order to avoid piezoelectric ceramics and The driving link of the flexible mechanism is separated during the working process, and the tail of the piezoelectric ceramic driver 11 is screwed on the base 2 through the holes 21, and installed between the driving link of the flexible mechanism and the base in an interference assembly manner to achieve pretension. The two translational precision positioning workbench...

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Abstract

The invention discloses a two-freedom-degree precision positioning working table for a nano-imprint photoetching system, comprising a base, a movable platform, a rigid bracket connected to the bottom part of the base and four flexible branched chains connected between the movable platform and the base; in the structure, four piezoelectric ceramic drivers are adopted, the tail part of each driver is connected with the base by a bolt, and the top end thereof is connected with a ball joint by threads to realize Hertz contact; two position sensors are used for measuring practical output of the movable platform and are respectively fixed between the rigid bracket and the movable platform. The precision positioning working table has the characteristics of high resolution ratio and rapid dynamic response speed, and can be used as an auxiliary locating platform of the nano-imprint photoetching system for realizing micro feeding and precision location.

Description

Technical field [0001] The invention relates to a micro operating system, in particular to a two-degree-of-freedom flexible parallel precision positioning workbench applicable to an imprinting photoetching system. Background technique [0002] Nano devices include nano electronic devices and nano optoelectronic devices, which can be widely used in electronics, optics, micromechanical devices, new computers, etc. It is the most dynamic research field in the research field of new materials and new devices, and it is also the miniaturization of components , Intelligence, high integration and other mainstream development directions. Because of the potential huge market and national defense value of nano-devices, the methods, approaches, and processes of their design and manufacturing have become the research and investment hotspots of many scientists, governments and large enterprises. At present, the design and manufacture of nanodevices are in a period of rapid development, with v...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
Inventor 田延岭贾晓辉张大卫
Owner 江苏金秋刺绣花边有限公司
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