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Homeotropic alignment type pixel structure and manufacturing method thereof

A technology of pixel structure and vertical alignment, which is applied in semiconductor/solid-state device manufacturing, optics, instruments, etc., and can solve the problems of pixel electrical influence, light leakage current of thin film transistors, and thickness increase.

Inactive Publication Date: 2010-09-08
AU OPTRONICS CORP
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AI Technical Summary

Problems solved by technology

As we all know, in the liquid crystal pixel structure, the amorphous silicon layer is a kind of photosensitive material, which will generate light leakage current after being irradiated with light. Since the protrusion needs a certain height in the vertically aligned pixel structure, it will correspondingly cause the gate of the thin film transistor to The increase of the thickness of the amorphous silicon region 14 will easily cause the light leakage current of the thin film transistor, and then cause adverse effects on the electrical properties of the pixel.

Method used

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  • Homeotropic alignment type pixel structure and manufacturing method thereof
  • Homeotropic alignment type pixel structure and manufacturing method thereof
  • Homeotropic alignment type pixel structure and manufacturing method thereof

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Embodiment Construction

[0040] Please refer to Figure 2A --2E, Figure 2A -- 2E is a schematic diagram of the process steps of the vertical alignment pixel structure of the present invention.

[0041] Such as Figure 2A As shown, first, a substrate 21 is provided, and a first metal layer is formed on the substrate 21 , and then, the first metal layer is patterned to form a gate 22 .

[0042] Please refer to Figure 2B ,exist Figure 2A On the basis of this, a gate insulating layer 23 is formed on the substrate 21 and covers the gate 22 . Then, an amorphous silicon layer is formed on the gate insulating layer 23 , and a doped amorphous silicon layer is formed on the amorphous silicon layer. Next, pattern the amorphous silicon layer and the doped amorphous silicon layer to form the gate amorphous silicon region 24 and the doped gate amorphous silicon region 25, and the gate amorphous silicon region 24 and the doped gate amorphous silicon region The crystalline silicon region 25 is correspondingl...

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Abstract

The invention relates to a homeotropic alignment type pixel structure and a manufacturing method thereof. The pixel structure comprises a gate, a gate insulation layer, a gate amorphous silicon area, a source metal area, a drain metal area, an organic matter protective layer, a conducting layer and slits, wherein the gate is formed on a base plate; the gate insulation layer covers on the gate; the gate amorphous silicon area is formed on the gate insulation layer and is correspondingly positioned above the gate; the source metal area and the drain metal area are formed on the gate amorphous silicon area; the organic matter protective layer is formed on the gate insulation layer and covers on the source metal area and the drain metal area and comprises a dielectric layer hole and a plurality of bulges, and the dielectric layer hole exposes the partial surface of the drain metal area; the conducting layer is formed on the organic matter protective layer and covers on the dielectric layer hole; and the slits are formed among the bulges. The invention prevents from forming the bulges on an amorphous silicon layer as a base by forming the bulges on the organic matter protective layer, thereby reducing the light leakage current garneted by a thin film transistor.

Description

technical field [0001] The present invention relates to a vertical alignment pixel structure and a manufacturing method thereof, in particular to a vertical alignment pixel structure capable of reducing light leakage current and a manufacturing method thereof. Background technique [0002] The multimedia technology in today's society is quite developed, mostly benefiting from the progress of semiconductor components and display devices. As far as displays are concerned, liquid crystal displays with superior characteristics such as high image quality, good space utilization efficiency, low power consumption, and no radiation have gradually become the mainstream of the market. In order to make LCDs have better display quality, current LCDs are developing towards the characteristics of high contrast, no gray scale inversion, small color cast, high brightness, high color saturation, fast response and wide viewing angle. In terms of wide viewing angle technologies, common ones i...

Claims

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Application Information

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IPC IPC(8): H01L27/12H01L29/786H01L21/84H01L21/336G02F1/1362
Inventor 蓝志杰
Owner AU OPTRONICS CORP
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