Method for laser interference lithography using diffraction grating

一种激光干涉光刻、衍射光栅的技术，应用在激光干涉光刻领域，达到简化光学系统、高分辨率的效果

Active Publication Date: 2010-09-08
LG CHEM LTD
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Problems solved by technology

Furthermore, similar to existing laser interference lithography, a highly coherent laser source must be used, which is also considered an obstacle to mass production

Method used

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  • Method for laser interference lithography using diffraction grating
  • Method for laser interference lithography using diffraction grating
  • Method for laser interference lithography using diffraction grating

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Embodiment Construction

[0056] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. Before the introduction, it should be understood that the terms used in the description and the appended claims should not be construed as limited to the general and dictionary meanings, but should be based on the meanings and concepts corresponding to the technical solutions of the present invention Interpretation, that is, based on principles that allow the inventor to define terms appropriately for best explanation. Therefore, the description presented here is only a preferred example for the purpose of illustration, and is not intended to limit the scope of the present invention, so it should be understood that other modifications can be made thereto without departing from the spirit and scope of the present invention. Equivalent substitutions and modifications.

[0057] Figure 4 is a schematic diagram showing a laser interference l...

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Abstract

A method for laser interference lithography using a diffraction grating includes (a) forming a photoresist layer on a work substrate to which a repeated fine pattern is to be formed; (b) forming a refractive index matching material layer on the photoresist layer; (c) forming on the refractive index matching material layer a diffraction grating layer having a period of diffraction grating within the range from [lambda] / ng to [lambda] / n0 ([lambda] is a wavelength of laser beam, ng is a refractive index of the diffraction grating, and n0 is a refractive index in the air or in vacuum); and (d) exposing the photoresist layer by means of mutual interference of positive and negative diffracted lights with the same absolute value by inputting a laser beam perpendicularly to the diffraction grating layer. This method allows to realize an interference pattern with higher resolution and to use a laser source with lower coherence.

Description

technical field [0001] The present invention relates to a method of laser interference lithography using a diffraction grating, and more particularly, the present invention relates to a method of laser interference lithography using a diffraction grating by vertically inputting a laser source onto the diffraction grating and utilizing the The interference of positive and negative order diffracted light with the same absolute diffraction value in the grating realizes a high-resolution (submicron level) pattern. Background technique [0002] In general, laser interference lithography is a technique of performing exposure by using an interference pattern generated in an overlapping region of light with high coherence having several traveling wave vectors. That is to say, laser interference lithography is a technology that exposes the interference pattern formed in the overlapping area of ​​light to the photoresist layer, and then develops it. Laser interference lithography has...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/42
CPCG03F7/70408G02B5/1809G02B5/1814G02B5/1819G02B5/1857G02B27/0043G02B27/4222
Inventor 金台洙金在镇申铉雨
Owner LG CHEM LTD
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