Semiconductor device and method for manufacturing the same
A manufacturing method and semiconductor technology, applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve problems such as instability, Schottky contact, low good contact, that is, ohmic contact, etc., and achieve the effect of improving manufacturing yield
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Embodiment 1
[0060] Embodiment 1 of the present invention is for explaining the structure of an example in which the present invention is applied to a semiconductor device having a punch-through IGBT having a trench structure.
[0061] Such as figure 1 As shown, the IGBT of Embodiment 1 has:
[0062] a first semiconductor layer 1 of the first conductivity type;
[0063] A fourth semiconductor layer 2 of a second conductivity type opposite to the first conductivity type formed on the first semiconductor layer 1;
[0064]A fifth semiconductor layer 3 of the second conductivity type formed on the fourth semiconductor layer 2;
[0065] A second semiconductor layer 4 of the first conductivity type formed on the fifth semiconductor layer 3;
[0066] A third semiconductor layer 5 of the second conductivity type formed in an island shape on the second semiconductor 4;
[0067] The insulating film 7 formed on the second semiconductor layer 4 and the third semiconductor layer 5;
[0068] A con...
Embodiment 2
[0090] Embodiment 2 of the present invention is for describing an example in which the present invention is applied to a semiconductor device including a vertical power MOSFET having a trench structure.
[0091] Such as Figure 5As shown, the vertical power MOSFET shown in Embodiment 2 has: the first semiconductor layer 1 of the second conductivity type, the fifth semiconductor layer 3 of the second conductivity type formed on the first semiconductor layer 1, and the fifth semiconductor layer 3 formed on the fifth semiconductor layer. The second semiconductor layer 4 of the first conductivity type formed on the layer 3, the third semiconductor layer 5 of the second conductivity type formed in an island shape on the second semiconductor layer 4, the second semiconductor layer 4 and the third semiconductor layer The insulating film 7 formed on the insulating film 7, the control electrode 21 formed on the insulating film 7, the first main electrode 22 electrically connected to th...
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