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Semiconductor device and method for manufacturing the same

A manufacturing method and semiconductor technology, applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve problems such as instability, Schottky contact, low good contact, that is, ohmic contact, etc., and achieve the effect of improving manufacturing yield

Inactive Publication Date: 2010-09-22
SANKEN ELECTRIC CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

According to this method, although the latch-up effect can be prevented by reducing the hole current, it is difficult to obtain a good contact between the collector layer 1 with a low impurity concentration and the collector electrode 23a, that is, an ohmic contact, and a Schottky electrode can be easily formed. touch
As a result, such as Figure 7 As shown, while causing a high on-state voltage to occur, an unstable operation in which the output voltage VCE is not proportional to the output current IC occurs at start-up

Method used

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  • Semiconductor device and method for manufacturing the same
  • Semiconductor device and method for manufacturing the same
  • Semiconductor device and method for manufacturing the same

Examples

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Embodiment 1

[0060] Embodiment 1 of the present invention is for explaining the structure of an example in which the present invention is applied to a semiconductor device having a punch-through IGBT having a trench structure.

[0061] Such as figure 1 As shown, the IGBT of Embodiment 1 has:

[0062] a first semiconductor layer 1 of the first conductivity type;

[0063] A fourth semiconductor layer 2 of a second conductivity type opposite to the first conductivity type formed on the first semiconductor layer 1;

[0064]A fifth semiconductor layer 3 of the second conductivity type formed on the fourth semiconductor layer 2;

[0065] A second semiconductor layer 4 of the first conductivity type formed on the fifth semiconductor layer 3;

[0066] A third semiconductor layer 5 of the second conductivity type formed in an island shape on the second semiconductor 4;

[0067] The insulating film 7 formed on the second semiconductor layer 4 and the third semiconductor layer 5;

[0068] A con...

Embodiment 2

[0090] Embodiment 2 of the present invention is for describing an example in which the present invention is applied to a semiconductor device including a vertical power MOSFET having a trench structure.

[0091] Such as Figure 5As shown, the vertical power MOSFET shown in Embodiment 2 has: the first semiconductor layer 1 of the second conductivity type, the fifth semiconductor layer 3 of the second conductivity type formed on the first semiconductor layer 1, and the fifth semiconductor layer 3 formed on the fifth semiconductor layer. The second semiconductor layer 4 of the first conductivity type formed on the layer 3, the third semiconductor layer 5 of the second conductivity type formed in an island shape on the second semiconductor layer 4, the second semiconductor layer 4 and the third semiconductor layer The insulating film 7 formed on the insulating film 7, the control electrode 21 formed on the insulating film 7, the first main electrode 22 electrically connected to th...

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Abstract

Disclosed is a semiconductor device comprising a first semiconductor layer (1), a second semiconductor layer (4) formed on the first semiconductor layer (1), a third semiconductor layer (5) formed in the form of islands on the second semiconductor layer (4), an insulating film (7) formed on the second semiconductor layer (4) and the third semiconductor layer (5), a control electrode (21) formed on the insulating film (7), a first main electrode (22) electrically connected with the second semiconductor layer (4) and the third semiconductor layer (5), and a second main electrode (23) electrically connected with the first semiconductor layer (1) and containing Pd. A method for manufacturing the semiconductor device is also disclosed.

Description

technical field [0001] The present invention relates to a semiconductor device as an insulated gate type semiconductor element and a method of manufacturing the same. Background technique [0002] The insulated gate bipolar transistor is called IGBT (Insulated Gate Bipolar Transistor), which can simultaneously realize the high-speed operation of the metal oxide semiconductor field effect transistor (MOSFET, Metal Oxide Semiconductor Field Effect Transistor) and the low on-state voltage of the bipolar transistor. power semiconductor components. [0003] Figure 6 It is a side sectional view showing a penetration type IGBT having a conventional trench structure. The IGBT has a semiconductor layer 10 composed of a p+-type collector layer 1, an n+-type buffer layer 2, an n-type drift layer 3, a p-type base layer 4, and an n+-type emitter layer 5, and further has: formed from the semiconductor layer 10 The main surface 11 of the main surface 11 reaches the groove 6 inside the d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/78H01L21/28H01L29/417H01L29/739
CPCH01L29/41741H01L29/7397H01L29/456H01L29/66348H01L29/0847
Inventor 鸟居克行杉山欣二
Owner SANKEN ELECTRIC CO LTD