A segmented type asymmetric silicon controlled rectifier electrostatic discharge device embedded with P+ injection regions
A technology of electrostatic discharge and injection area, applied in the direction of electric solid devices, electrical components, semiconductor devices, etc., can solve the problems of high device sustaining voltage, failure current drop, etc., achieve high sustaining voltage, increase sustaining voltage, and increase parasitic resistance. Effect
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[0033] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0034] Such as image 3 As shown, a segmented asymmetric thyristor electrostatic discharge device embedded in a P+ implantation area includes a P-type substrate 100; a P-type epitaxial layer 300 is arranged above the P-type substrate 100, and the P-type substrate 100 and An N-type buried layer 200 is disposed between the P-type epitaxial layers 300 ; a first deep N well 400 , a second deep N well 401 and a third deep N well 402 are sequentially disposed above the N-type buried layer from left to right.
[0035] The left side of the first deep N well 400 is provided with a first shallow P well 500, and the upper right of the first deep N well 400 is provided with a first shallow N well 501, between the first deep N well 400 and the second deep N well 401 A second shallow P well 502 is arranged between them, a second shallow N well 503 is arranged in the...
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