Asymmetric bidirectional silicon controlled rectifier electrostatic discharge device in an interdigital mode and manufacturing method thereof
It is an electrostatic discharge and asymmetric technology, which is applied in the fields of electrical solid-state devices, semiconductor/solid-state device manufacturing, electrical components, etc., and can solve problems such as irreconcilability, failure to turn off, and influence on the operation of the core circuit.
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[0054] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0055] Such as image 3 As shown, an interdigitated asymmetric triac electrostatic discharge device includes a P-type substrate 101; a P-type epitaxial layer 301 is arranged above the P-type substrate 101, and the P-type substrate 101 and the P-type An N-type buried layer 201 is provided between the epitaxial layers 301;
[0056] The P-type epitaxial layer 301 is provided with a first high voltage N well 401, a second high voltage N well 402 and a third high voltage N well 403 sequentially from left to right;
[0057] A first deep N well 501 is provided in the first high voltage N well 401, a second deep N well 502 is provided in the second high voltage N well 402, and the left side of the second deep N well 502 is wider than the second high voltage N well 402 , the third deep N well 503 is provided in the third high voltage N well 403 and the left si...
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