Silicon substrate with period structure
A technology of periodic structure and silicon substrate, applied in microstructure technology, microstructure device, nanostructure manufacturing, etc., can solve the problems of long preparation process time of patterned silicon substrate, poor uniformity of periodic structure, and increased cost of silicon substrate, etc. To achieve the effect of reducing production cost and preparation process time, low cost and improving performance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0044] Such as Figure 4A to Figure 4F As shown, this is a schematic diagram of the steps of arranging the nanospheres on the surface of the silicon substrate in a preferred embodiment of the present invention. First, if Figure 4A As shown, a silicon substrate 21 and a colloidal solution 25 located in a container 26 are provided, wherein the colloidal solution 25 is mixed by a plurality of nanospheres (not shown) and a surfactant (not shown) become. Then, place this silicon substrate 21 in the container 26 and make the silicon substrate 21 completely immersed in the colloidal solution 25, as Figure 4B shown. After standing for a few minutes, the nanospheres 22 are gradually and orderly arranged on the surface of the silicon substrate 21, forming a so-called "nanosphere layer", such as Figure 4C shown. Then, a volatile solution 27 is poured into the container 26 to volatilize the aforementioned colloidal solution 25, as Figure 4D shown. Finally, if Figure 4E As sho...
PUM
Property | Measurement | Unit |
---|---|---|
length | aaaaa | aaaaa |
diameter | aaaaa | aaaaa |
depth | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com