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Movable holder for silicon-based film solar cells

A technology of solar cells and movable fixtures is applied in the field of solar cells to achieve the effects of small access capacitance, large discharge area, and avoidance of inaccessible contact.

Inactive Publication Date: 2010-11-10
SHEN ZHEN TRONY SCI & TECH DEV CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The present invention aims to solve the problem of uniformity and consistency of the high-speed deposited film driven by VHF power supply through the above analysis of the technical problems to be solved urgently in the existing crystallized silicon-based thin film

Method used

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  • Movable holder for silicon-based film solar cells
  • Movable holder for silicon-based film solar cells
  • Movable holder for silicon-based film solar cells

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] The electrode plate is vertical, the feeding port of the cathode plate is triangular, and the feeding component is a cylinder.

[0036] The following is attached Figure 1-6 Specific embodiments of the present invention will be further described.

[0037] The movable fixture of the thin-film solar cell of the present invention uses a very high frequency power supply with an operating frequency (27.12-100MHz). Vacuum chamber 01 is used for realizing vacuum state, and gas system inlet 101 is arranged on it, power supply system inlet 102, vacuum system inlet 105, and the movable door that can open is installed in front of vacuum chamber 01. The fixture 02 is discharged in a vacuum environment, and the substrate 206 is deposited in a large-area uniform electric field chamber to deposit a p-i-n heterojunction laminated film to form a thin-film solar cell core board or chip, which is suitable for mass production. The upper inlet of the gas pipeline fixed on the fixture 02 i...

Embodiment 2

[0039] The feeding port of the cathode plate is a triangle, and the feeding component is a cylinder.

[0040] Figure 7 The fixture used is the same as in Example 1. In this embodiment, a vertical deposition chamber is adopted, and 12 pairs of electrodes are composed of 6 anode plates 208 and 12 cathode plates 203 , and the two cathode plates 203 share one anode plate 208 . 24 substrates 206 can be coated at the same time. Specific steps are as follows:

[0041] a) Place 24 glass substrates 206 (1640mm×707mm×3mm) with a 600nm thick transparent conductive film on 24 substrate positions in the jig 02, with the film facing outward and the glass facing the electrode plate.

[0042] b) Open the movable door of the vacuum chamber, push the jig 02 into the vacuum chamber 01 along the track 104, and close the movable door.

[0043] c) Vacuum to 5.0×10 -4 After Pa, argon gas was introduced, and when the pressure in the chamber reached 60Pa, the 40.68MHz VHF power supply was turned...

Embodiment 3

[0049] The electrode plate is vertical, the feed-in opening of the cathode plate is triangular, the feed-in component is a cylinder, and an anti-interference shielding device (not shown) is provided between the fixtures.

[0050] Figure 8 Use clamp with embodiment 1. In this embodiment, 6 fixtures 02 are used, and 24 substrates can be plated at the same time. Two cathode plates 203 in each fixture 02 share one anode plate 208 to form two pairs of electrodes, which can coat four substrates 206 at the same time.

[0051] a) Place 24 glass substrates 206 (1640mm×707mm×3mm) with a 600nm thick transparent conductive film on the substrate positions in 6 fixtures 02, with the film facing outward and the glass facing the electrode plate.

[0052] b) Open the movable door of the vacuum chamber, push the jig 02 into the vacuum chamber 01 along the track 104, and close the movable door of the vacuum chamber.

[0053] c) Vacuum to 5.0×10 -4 After Pa, argon gas was introduced. When th...

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Abstract

The invention discloses a movable holder for silicon-based film solar cells, which belongs to the technical field of solar cells. The movable holder mainly has the following technical characteristics that: a supporting housing is a movable housing with grounded side frames, a holder comprising electrode plates is mounted on the supporting housing, and anti-interference shield assemblies are arranged between holders or holder arrays. The triangular end surface of a signal feed-in module with a cylindrical waist is contacted with a signal feed-in port and positioned in a concave triangular surface in the central area of the back plane of the negative plate to feed in radio frequency / very high frequency power signals, and the positive plate is grounded. Each negative plate-shielding cover is provided with a through hole, and the negative plate is insulated from the shielding cover. The invention has the advantage that because of feed-in on the central surface of the electrode plate, the loss of one-point or multi-point feed-in, which is caused by the feeder distance, is avoided. When a radio frequency / very high frequency power supply is used for driving, a uniform electric field can be formed to stably discharge in a large area, standing wave and skin effects are effectively eliminated, consequently, the yield is increased, and the cost is reduced.

Description

technical field [0001] The invention discloses a solar cell technology, specifically a movable fixture for a silicon-based thin-film solar cell that can be pushed into a vacuum chamber. Background technique [0002] At present, silicon-based thin-film solar cells use plasma-enhanced chemical vapor deposition (PECVD) to obtain single-junction or multi-junction photoelectric conversion P-I-N film layers. This kind of RF capacitively coupled parallel electrode plate reaction chamber is commonly used in the thin-film solar cell manufacturing industry. The electrode array composed of electrode plate assembly or electrode plate is used for plasma chemical vapor deposition in the reaction chamber. In the industry, the electrode with a supporting frame is usually called a "fixture", and the device installed in the chamber for plasma chemical vapor deposition is also called a "deposition box", that is, the so-called reaction chamber. [0003] The RF capacitively coupled parallel pla...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18C23C16/505H01J37/04H05H1/46H01L31/042
CPCH01L21/67313H01L21/6734C23C16/505H01J37/32577H01L31/18C23C16/545H01J37/32715H01J37/32091H01L21/67326Y02E10/50H01L31/042H05H1/46
Inventor 胡盛明李毅何祝兵李志坚周建华王春柱
Owner SHEN ZHEN TRONY SCI & TECH DEV CO LTD
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