Process and apparatus for producing fluorinated gaseous compound

A manufacturing method and compound technology, applied in the direction of nitrogen compounds, interhalogen compounds, chemical instruments and methods, etc., can solve the problems of increasing the capacity of the reactor 22, and achieve the effect of less risk of failure and simple equipment
CN101896423AInactive Publication Date: 2010-11-24CENT GLASS CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
CENT GLASS CO LTD
Publication Date
2010-11-24
Estimated Expiration
Not applicable · inactive patent

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Abstract

An apparatus for producing a fluorinated gaseous compound. The apparatus includes a circulation system which comprises: a reaction zone in which a liquid mixture containing a raw-material liquid is reacted with a raw-material gas; a flow zone in which only the liquid mixture flows; an upper transfer zone in which the liquid mixture which has undergone the reaction is transferred from an upper part of the reaction zone to an upper part of the flow zone; and a lower transfer zone in which the liquid mixture is transferred from a lower part of the flow zone to a lower part of the reaction zone. (A) The raw-material gas is introduced into the lower part of the reaction zone, and (B) at least one fluorinated gaseous compound selected between a first fluorinated gaseous compound which is a reaction product yielded in the reaction zone and a second fluorinated gaseous compound obtained by further fluorinating the first fluorinated gaseous compound is introduced into the lower part of the reaction zone. The liquid mixture is circulated by these operations (A) and (B).
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Description

technical field

[0001] Fluorinated gaseous compounds, e.g. NF 3 , IF 5 , IF 7 、CIF 3 , WF 6 It is used as an internal cleaning agent for semiconductor manufacturing equipment such as CVD equipment and PVD equipment. Various studies have been conducted on methods for efficiently producing these gaseous compounds. In addition, the aforementioned NF 3 , IF 5 , IF 7 、CIF 3 , WF 6 , is a substance in which the fluorination reaction mentioned as an example in the present invention proceeds completely. Background technique

[0002] For example, the applicant proposed to make the liquid ammonium complex and the gaseous CIF 3 Reaction of interhalogen compounds such as, synthetic formula NF x L 3-x (L is a halogen other than F, and 1≤x≤3) represents a gaseous nitrogen halide method (see Patent Document 1). The nitrogen halide is further fluorinated in the following process and converted into NF 3 . In order to efficiently produce gaseous fluorinated compounds, it is pr...

Claims

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