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Sputtering system and method including an arc detection system

A sputtering system and arc technology, applied in the field of sputtering systems, can solve the problem of slow output voltage drop

Active Publication Date: 2013-02-13
MKS INSTR INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Similarly, dV / dT based detection circuits suffer from the limitation of sometimes not being able to identify the presence of slow moving arcs due to the slow drop in detected output voltage of the DC power supply

Method used

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  • Sputtering system and method including an arc detection system
  • Sputtering system and method including an arc detection system
  • Sputtering system and method including an arc detection system

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Embodiment Construction

[0015] The following descriptions of various embodiments are merely exemplary in nature, and are in no way intended to limit the present teachings, applications, or uses.

[0016] see figure 1 , shows a DC sputtering system 10 according to one embodiment of the present disclosure. System 10 is used to deposit a coating on a workpiece 12 . The workpiece 12 may include optical disc storage media such as compact discs (CD) and digital video discs (DVD), drill bits, glass panels, cutting tools, toys, or any other component or substrate that requires a sputtered surface film for its use and operation. end. Sputtering system 10 includes a sputtering chamber 14 that provides a controlled environment for the deposition process. A vacuum pump 16 is coupled to port 14a in the sputtering chamber 14 and is used to maintain a controlled internal pressure within the sputtering chamber. A sputtering target 18 configured as a cathode (hereinafter referred to simply as "cathode" 18) serves...

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Abstract

A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (DC) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. A detection module detects the occurrence of an arc in the sputtering chamber by monitoring an electrical characteristic of the plasma. In one embodiment the electrical characteristic monitored is the impedance of the plasma. In another embodiment the electrical characteristic is the conductance of the plasma.

Description

technical field [0001] The present disclosure relates generally to plasma-based sputtering systems, and more particularly, to sputtering systems employing arc detection systems for detecting when an arc occurs within a DC (direct current) plasma sputtering chamber. Background technique [0002] With the increasing demand for optical and magnetic disk media such as CD, DVD, MD, MO, DLC films, and hard disks, the sputtering process used to manufacture these media is increasing in importance. There are many types of sputtering systems, all of which are used to deposit insulating or conductive coatings on devices ranging from semiconductors to drill bits. Films typically deposited onto optical and magnetic disk media are typically produced using a sputtering process with limited control over the sputtering gas. More precisely, with today's sputtering systems and methods, a substantial share of atmospheric and petrochemical volatility is present within the sputtering chamber at ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/34C23C14/54
CPCH01J37/3444H01J2237/0206H01J37/32944H01J37/34H01J37/3476H01J37/32027H01J37/32935H01J37/32055
Inventor 杰西·N·克莱因大卫·C·霍尔斯特德迈克尔·R·吉尔伯特
Owner MKS INSTR INC