Preparation method of chemical and mechanical polishing liquid of tungsten-molybdenum alloy material
A technology of chemical machinery and tungsten-molybdenum alloy, which is applied in the direction of polishing compositions containing abrasives, can solve the problems of inability to prepare high-purity polishing liquid, lower device yield, and scrapping of polishing liquid, so as to improve production efficiency and production quality , improve the yield, improve the effect of polishing quality
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Embodiment 1
[0025] (1) Use ultra-pure deionized water with a resistance of 18MΩ to clean the transparent polyethylene material airtight reactor and feed pipe three times, so that the resistance of the waste liquid after cleaning is not lower than 16MΩ.
[0026] (2) SiO 2 1920g of nano-scale silica sol with a mass percentage concentration of 50% and a particle size of 15-25nm and Al with a particle size of 200-500nm 2 o 3 Add 80g of powder into the cleaned transparent airtight reactor, so that the transparent airtight reactor is in a negative pressure and complete vortex state, and under the action of complete eddy current stirring, it is drawn in under the action of negative pressure while stirring, and the resistance is 18MΩ. 1880g of ionic water to obtain a diluted silica sol solution.
[0027] (3) Add 40 g of FA / O surfactant and 40 g of FA / O chelating agent into the transparent and airtight reaction kettle through the cleaned pipeline while performing complete vortex stirring, and co...
Embodiment 2
[0030] (1) Use ultra-pure deionized water with a resistance of 18MΩ to clean the transparent polyethylene material airtight reactor and feed pipe three times, so that the resistance of the waste liquid after cleaning is not lower than 16MΩ.
[0031] (2) SiO 2 2300g of nano-scale silica sol with a mass percentage concentration of 50% and a particle size of 15-25nm and Al with a particle size of 200-500nm 2 o 3 Add 100g of powder into the cleaned transparent airtight reactor, so that the transparent airtight reactor is in a negative pressure and complete vortex state, and under the action of complete eddy current stirring, it is drawn in under the action of negative pressure with a resistance of 18MΩ. 1500g of ionic water to obtain a diluted silica sol solution.
[0032] (3) Add 40g of JFC and 30g of FA / O chelating agent into the transparent and airtight reaction kettle through the cleaned pipeline while performing complete vortex stirring, and continue to maintain a complete ...
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