Three-rod quartz boat for vertical oxidation furnace tube

A technology of quartz boats and oxidation furnaces, which is applied in the manufacture of electrical components, semiconductor/solid-state devices, circuits, etc., can solve the problems of device function failure, particles falling to the surface of a silicon wafer below, etc., to prolong the deformation period and improve particle size. condition, the effect of prolonging the service life

Active Publication Date: 2011-06-29
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, during the operation, the 4-rod quartz boat carries silicon wafers from room temperature into the 800°C reaction chamber, and during the process from the 800°C reaction chamber to room temperature, due to temperature changes, silicon wafers and The boat is deformed, and the extra supporting point of the quartz boat (three points supporting a plane) is easy to rub against the silicon wafer, and the particles generated by the friction will fall to the surface of the silicon wafer below, and these particles will affect the device and cause its function to fail.

Method used

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  • Three-rod quartz boat for vertical oxidation furnace tube
  • Three-rod quartz boat for vertical oxidation furnace tube
  • Three-rod quartz boat for vertical oxidation furnace tube

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Embodiment Construction

[0030] The present invention is used for the three-column quartz boat of vertical oxidation furnace pipe, comprises upper cover 1, bottom plate 2, three vertical upright columns, and upper cover 1 and bottom plate 2 are rings with the same size, and the top end of vertical upright column connects ring-shaped upper cover 1, and the bottom end Connect the ring base plate 2. The inner side of the column is provided with a plurality of slots for silicon wafers, and the slots for silicon wafers are arranged along the axial direction of the column for supporting the silicon wafers.

[0031] The cross section of the column is circular, wherein the first column A and the second column B are arranged symmetrically with respect to the central column C, and the connecting line between the two columns A and B deviates from the diameter of the upper cover 1 and the bottom plate 2 . The diameter of the central column C is larger than the other two columns A and B.

[0032] The diameter of ...

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Abstract

The invention discloses a three-rod quartz boat for a vertical oxidation furnace tube. The boat comprises an upper cover, a bottom plate and three rods, wherein the top end of each rod is connected with the annular upper cover, while the bottom end is connected with the annular bottom plate; a silicon chip groove is formed on the inner side of each rod; the first rod and the second rod are symmetrically arranged with respect to a central rod; a reinforcing rod is arranged between the central rod and the two rods respectively; the section of the reinforcing rod is semicircular; and a plurality of arc-shaped reinforcing ribs are arranged between the reinforcing rod and an adjacent rod. The three-rod quartz boat is applied to the vertical oxidation furnace tube at normal pressure and normal temperature, a deformation period can be effectively prolonged at high temperature, the granule condition of the product is obviously improved, the service life is prolonged, and the production cost is reduced.

Description

technical field [0001] The invention relates to an integrated circuit manufacturing equipment, in particular to a three-column quartz boat used for a vertical oxidation furnace tube. Background technique [0002] In the integrated circuit manufacturing plant (IC foundry), the atmospheric pressure high temperature oxidation furnace tube process is used to generate silicon dioxide on the silicon wafer by thermal oxidation growth, which is used for Gate Oxide (gate oxidation), Pad Oxide (pad oxide) ), Sac Oxide (sacrificial oxidation) or Field Oxide (field oxidation), can also be used as processes such as Anneal (annealing) and Well Drive (well driving). The reaction temperature of the above process ranges from 800°C to 1100°C, and the reaction pressure is generally close to atmospheric pressure. [0003] The atmospheric pressure high temperature oxidation furnace tube process is carried out in the vertical furnace tube. The reaction chamber inside the vertical furnace tube is...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/673
Inventor 谭俊庄忠尔丁文斌
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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