Imaging adjustment unit and focusing and leveling control system using the unit

Abstract

The invention puts forward an imaging adjustment unit and a focusing and leveling control system using the unit. The focusing and leveling control system comprises a lighting unit, a marking plate, a projection imaging unit, a detector and a controller. The lighting unit generates light beams which pass through a plurality of marks on the marking plate so as to form multiple incident rays projecting images on a silicon chip surface, so that several marked projections come into being. And the marked projections are reflected by the silicon chip surface, thus forming multiple reflected rays projecting images on the detector which controls the movement of a workpiece table. And the imaging adjustment unit includes a first imaging adjustment unit located in the optical path of the incident rays and a second imaging adjustment unit located in the optical path of the reflected rays. Wherein, the first imaging adjustment unit adjusts the optical length of the incident rays for focusing them simultaneously on the silicon chip surface, and the second imaging adjustment unit adjusts the optical length of the reflected rays for focusing them simultaneously on the detection surface of the detector. The imaging adjustment unit provided in the invention has a simple structure and is convenient for installation.

Description

technical field [0001] The invention relates to a control system, and in particular to a control system for adjusting silicon wafers in a photolithography machine, and an imaging adjustment unit included in the control system is also involved. Background technique [0002] The projection lithography machine is a device used to project the pattern on the mask onto the surface of the silicon wafer through the projection objective lens. In the projection exposure equipment, there must be an automatic focusing and leveling control system to accurately set the surface of the silicon wafer to the designated exposure position. [0003] There are many different technical solutions for realizing the automatic focusing and leveling control function. At present, the non-contact photoelectric measurement technology is more commonly used, in which the optical part of the measurement system adopts an optical structure that satisfies oblique imaging. The main purpose is to make the focus ...

AI Technical Summary

Problems solved by technology

[0005] The present invention proposes an imaging adjustment unit and a focusing and leveling control system using it, which can solve the above-mentioned problem of difficult installation and simplify its own structure without changing the imaging accuracy

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