Power semiconductor device
A power semiconductor and oxide semiconductor technology, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of weakening the avalanche characteristics of semiconductor devices, low UIS current value, wide current distribution range, etc., to achieve enhanced avalanche characteristics, UIS current The effect of increasing the value and narrowing the current distribution range
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0063] Image 6 An N-channel mosfet transistor including a dummy region 650 according to a preferred embodiment of the present invention is shown, which is also Figure 4 The cross-sectional view of the trench MOSFET shown along the b-b' section. The N-channel MOSFET is located on the N+ substrate 600 , the upper surface thereof is an N-type epitaxial layer 601 , and the lower surface thereof is a drain metal 690 . The N-channel trench metal oxide semiconductor field effect transistor device further includes a plurality of first trenches formed inside the N-type epitaxial layer 601, and the inner surface of the first trenches is lined with gates. The pole oxide layer 620 is filled with doped polysilicon 610 . The P-type body region 602 is formed between every two adjacent first trenches, and the portion near the upper surface of the P-type body region 602 in the active region 640 includes the N+ source region 603 . The trench metal oxide semiconductor field effect transisto...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More - R&D
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com
