6 results about "Diffusion resistance" patented technology

The application relates to the technical field of intelligent water treatment control, and discloses a system for simulating and predicting the kinetics of the adsorption capacity of biochar, which comprises the following modules: a data acquisition module uses the Arrhenius equation to introduce a temperature correction coefficient to perform thermodynamic compensation on adsorption kinetic constants; a flow state recognition module determines a forward adsorption or reverse desorption working condition based on the Langmuir model; a resistance decoupling module calculates the mass transfer Biot number based on the double membrane theory to distinguish the liquid film and the internal diffusion resistance of the particles, and uses a physical blockage index to distinguish physical blockage and chemical saturation; a hysteresis compensation module introduces a hysteresis correction factor to correct the desorption equilibrium concentration and calculate the recovery adsorption capacity during the reverse desorption; and a service life prediction module uses a dynamic utilization rate coefficient to correct the theoretical residual capacity and generate operation and maintenance instructions. Through the resistance decoupling and hysteresis compensation mechanisms, the physical and chemical attenuation mechanisms are effectively distinguished, and the precise prediction of the adsorption breakthrough time under dynamic working conditions is realized.

This invention relates to a method for modeling the curing kinetics of polymer resins, specifically providing a method for fitting the curing kinetics of polymer resins based on a segmented model. The method employs a three-stage segmented kinetic model. In the first stage, an external catalytic model is introduced to quantify the inductive acceleration effect of the co-catalyst in the early stages of the reaction. In the second stage, the Kamal-Sourour model is used to ensure the fitting accuracy of the chemical control region. In the third stage, a diffusion correction term based on thermodynamic evolution is introduced to quantify the diffusion resistance caused by entering the glassy state in the later stages, significantly improving the fitting accuracy at the end of curing. More importantly, this invention creatively proposes a method based on the activation energy minimum point. α tr and dynamic glass transition point α vit The segmentation points effectively couple the external catalytic model, the Kamal-Sourour model, and the dynamic diffusion model, effectively solving the problem of inaccurate fitting of the full-cycle kinetics, improving the fitting accuracy, and providing data support for the fine-tuning of the curing process.

The application provides an etching-induced defect FeSe-sepiolite composite material and a preparation method and application thereof, and belongs to the technical field of industrial flue gas purification. A selenium source, a reducing agent, an iron source and a surfactant are mixed, etched FeSe is prepared through a hydrothermal reaction-acid etching treatment, and then is mechanically ball milled with sepiolite to obtain the etching-induced defect FeSe-sepiolite composite material. In the composite material, FeSe serves as an active substance, can inhibit the organicization and re-release of mercury from the root due to the antagonism between Hg and Se, and reduces the risk of secondary pollution; sepiolite has a natural fibrous structure, can provide an efficient mass transfer channel, reduces the diffusion resistance of Hg 0 , and simultaneously strengthens the interface bonding between FeSe and sepiolite by means of the shear force generated by mechanical ball milling, so that the structural stability of the adsorbent and the resistance to flue gas scouring are improved.

This application discloses a two-dimensional polymer thin film based on reactive diffusion theory, its preparation method, and its applications. The film exhibits a typical bilayer structure: the lower layer is a continuous and dense covalent organic framework substrate film with good crystallinity; the upper layer is a cyclic / honeycomb Turing structure formed by the orderly assembly of nanoparticles, exhibiting strong periodicity and high uniformity. The preparation method employs gas-liquid interface reactive diffusion: the monomer is dissolved in a mixed solvent of DMF and chlorobenzene, and acetic acid is used as a catalyst, which is then dropped onto the surface of deionized water. By controlling the monomer concentration (5 mg / mL), molar ratio (2:3), drop volume (15 μL), and diffusion resistance, the Turing structure can be precisely controlled. This invention features a mild process, can be used for large-area preparation, and produces thin films with regular structures and excellent stability. It can be directly applied to flexible electronics, membrane separation, sensing, and catalysis, effectively solving the technical bottlenecks of uncontrollable morphology, low crystallinity, and difficulty in large-scale production of traditional two-dimensional polymer thin films.

The application discloses nitrogen-doped high-entropy alloy powder and a preparation method thereof. In order to solve the problems of low gap nitrogen solid solubility, easy precipitation of brittle metal nitride and uneven composition in the existing physical nitriding technology, the application adopts anhydrous metal halide, alkali metal amide and alkali metal azide as a reaction precursor. In the process of closed heating reaction, the amide is melted to provide a continuous liquid phase mass transfer medium; the azide is decomposed to release alkali metal and local high-pressure nitrogen gas; the alkali metal drives the metal halide to co-reduction; in the initial stage of nucleation and growth, the multi-component metal atoms are combined with the amino free radicals and high-pressure nitrogen gas in the system to directly embed nitrogen atoms into the lattice gap position, and high-concentration in-situ solid solution doping is completed. The application avoids the diffusion resistance of gas molecules in the traditional gas-solid nitriding, and realizes the preparation of alloy powder with high purity, uniform phase and no precipitation of brittle metal nitride.