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Position control apparatus of flexible bilateral driving device, and setting method of relative parameters

A bilateral drive and control device technology, which is applied in the direction of using feedback control, photolithography exposure device, microlithography exposure equipment, etc., to achieve the effect of improving nonlinear damping adjustment, reducing stabilization time, and improving synchronization ability

Active Publication Date: 2015-03-25
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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Problems solved by technology

However, the research is still mainly on low-level systems

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  • Position control apparatus of flexible bilateral driving device, and setting method of relative parameters
  • Position control apparatus of flexible bilateral driving device, and setting method of relative parameters
  • Position control apparatus of flexible bilateral driving device, and setting method of relative parameters

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Embodiment Construction

[0040] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific examples, and various modifications and changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention.

[0041] In the present invention, it relates to a control device for a structural system containing a flexible body. Here, the flexible body structure system will be explained firstly. The present invention mainly solves the problems caused by the system of the flexible bilateral drive equipment, for example, the bilateral synchronous control driven by two longitudinal linear motors. In bilateral drive control, the outputs of two sets of servo sy...

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Abstract

The invention provides a position control apparatus of a flexible bilateral driving device, and the apparatus comprises a measure sensor, a position control unit and an execution unit, and the method comprises the following steps: the practical position of the measure sensor is measured, through transformation and compensation of the position control unit, the corrected position is transferred back to the device by the execution unit. The invention is capable of raising the synchronization capability of a system, raising the anti-interference performance; reducing or eliminating the servo error caused by the interference; realizing the precision positioning of a multi freedom system, minimizing stabilization time when accelerating or decelerating in a period for increasing the production capacity; greatly improving the non-linear damping adjustment, reducing the heat dissipation of a flexible body in a movement process, enhancing the anti-fatigue capability of the flexible body for prolonging the life for further. In addition, the invention provides a flexible bilateral driving device by using the position control apparatus which is capable of realizing the vibration damping of the workpiece bench and accurate position compensation.

Description

technical field [0001] The invention relates to a position control technology of a flexible bilateral drive device, in particular to a position control device of a flexible bilateral drive device, a flexible bilateral drive device using the position control device, and a method for setting related parameters. Background technique [0002] A lithographic apparatus is a machine that applies a mask pattern to a target silicon wafer. The photolithography apparatus in the prior art is mainly used in the manufacture of integrated circuits (ICs) or other micro devices. Through a photolithography device, multi-layer masks with different mask patterns are sequentially imaged under precise alignment on a photoresist-coated silicon wafer, such as a semiconductor silicon wafer or an LCD panel. Lithography devices are generally divided into two categories, one is a stepping lithography device, which images all mask patterns on an exposure area of ​​a silicon wafer at one time; the other...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G05D3/12
Inventor 吴立伟陈锐李志龙
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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