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A Method of Improving Plasma Characteristics Using Pulse Modulation

A pulse modulation and plasma technology, applied in the field of plasma technology, to achieve the effects of wide application, improved plasma characteristics, and huge economic benefits

Inactive Publication Date: 2011-12-14
DALIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The invention provides a method for improving plasma characteristics by pulse modulation, which solves the problem of controlling the temperature and density of various components in the system in plasma application technology

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0009] The specific implementation manner of the present invention is described below in conjunction with technical scheme.

[0010] We use this method to deposit SiC thin films. The working power of the device adopts a pulse-modulated 13.56MHz radio frequency power supply, the modulation frequency is continuously adjustable from 20Hz-2kHz, and the duty cycle is continuously adjustable from 5-95%. The reaction chamber is in the shape of a cylinder, and the cylinder is made of glass. The upper and lower electrodes are made of stainless steel. The lower electrode is the driving electrode with a diameter of 5cm. The upper electrode is grounded and has a diameter of 30cm. There is an observation window in the middle. The distance between the upper and lower electrodes is adjustable from 2-10cm; the substrate is a silicon wafer and placed on the lower electrode; The working medium is silane and ethylene, and the carrier gas is argon, which is used to deposit silicon carbide film. ...

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Abstract

The invention belongs to the field of plasma application and relates to a method for improving plasma characteristics by pulse modulation. Its characteristic is to carry out pulse modulation on the power supply (frequency in the range of 2MHz-100MHz), that is, to make the power supply voltage output for a certain period of time (power supply operation), and not output for the next period of time (power supply stop), and the two are carried out alternately, that is, the power supply works The method is pulsed; adjust the frequency and duty cycle of the pulse modulation, combined with the adjustment of other discharge parameters, to improve the characteristics of the plasma. The effect and benefit of the invention is that the temperature and density of each component in the plasma can be comprehensively controlled, and it can be widely used in various fields of plasma application, bringing huge economic benefits.

Description

technical field [0001] The invention belongs to the field of plasma technology application and relates to a method for improving plasma characteristics by pulse modulation. Background technique [0002] Plasma technology has a very wide range of applications, mainly in two fields: high-temperature plasma and low-temperature plasma. The application of high-temperature plasma is mainly the research of controlled nuclear fusion, while the application of low-temperature plasma involves a wide range, and has important applications in thin film deposition, surface treatment, new material research, and plasma light sources. In the application of plasma, there are two important parameters, one is temperature, including electron temperature, ion temperature, neutral component temperature, etc., and the other is density, including electron density, ion density, working particle density, etc. These two types of parameters are interrelated and restrict each other. Under different appli...

Claims

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Application Information

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IPC IPC(8): H05H1/46
Inventor 张鹏云孙继忠王华强
Owner DALIAN UNIV OF TECH