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Optical system wave aberration detection device

A technology of optical system and detection device, which is applied in the field of optical measurement, can solve problems such as yaw error and sway error, and achieve the effect of eliminating yaw error and translation error

Inactive Publication Date: 2012-11-07
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

[0012] The present invention provides a wave aberration detection device for an optical system to solve the problem of yaw error and lateral shift error in the phase shifting process of the existing optical system wave aberration detection device

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  • Optical system wave aberration detection device

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specific Embodiment approach 1

[0018] Specific implementation mode 1. Combination figure 1 To illustrate this embodiment, the device includes a spectroscopic system, a second polarization splitting prism 12, a first coupling lens 13, a second coupling lens 14, a reference fiber 15, a test fiber 16, a first motorized polarization controller 17, a second motorized polarization Controller 18, tested optical system 19, photodetector 20, computer 21; Described spectroscopic system comprises laser 1, neutral density filter 2, 1 / 2 wave plate 3, the first polarization beam splitter prism 4, the first A quarter-wave plate 5, a second quarter-wave plate 6, a first corner cube prism 7, a second corner cube prism 8, a first plane reflector 10, a second plane reflector 11; the laser 1. After passing through the neutral density filter 2, the half-wave plate 3 and the first polarization beam splitter 4, the outgoing beam is divided into two orthogonal linearly polarized beams, and the first beam of linearly polarized ligh...

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Abstract

The invention discloses an optical system wave aberration detection device, relates to the technical field of optical measurement and solves the problem that the existing optical system wave aberration detection device has deflection error and translation error in the phase shift process. Two beams of common-path orthogonal line polarized light emitted from a light splitting system are split by asecond polarization splitting prism, a reference light and a testing light are coupled to a reference optical fiber and a testing optical fiber with a motor-driven polarization controller through a first coupling lens and a second coupling lens; a light emitted from the testing optical fiber is irradiated to a coated end face of the reference optical fiber by a detected optical system and is reflected, a first pyramid prism is adjusted so that a test spherical wave and a reference spherical wave generate interference, a second pyramid lens which is insensitive to the deflection error is movedby a piezoelectric ceramic so as to realize the phase shift process; a second plane mirror enables the wave aberration detection device to be insensitive to the translation error in the phase shift process; an interference image is acquired by using a photoelectric detector, and is input into the computer to be processed and analyzed by using a phase shift algorithm; therefore, the optical systemwave aberration is obtained.

Description

technical field [0001] The invention relates to the technical field of optical measurement, in particular to an optical system wave aberration detection device. Background technique [0002] Extreme ultraviolet lithography is a next-generation lithography technology based on traditional optical lithography, which inherits the development achievements of current optical lithography to the greatest extent. The working wavelength of extreme ultraviolet lithography is the extreme ultraviolet band of 13-14nm. There are major differences between traditional optical lithography and detection technology. As one of the core unit systems of the lithography machine, in order to achieve the requirements of lithography resolution and critical dimension control, the RMS wave aberration of the optical system should be less than λ / 20. Such a high-precision optical system requires a higher-precision detection device. At present, the more advanced interferometer products of Zygo and Wyko co...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G01M11/02
Inventor 金春水王丽萍张宇
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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