Process method for preparing tantalum nitride coating on surface of commemorative coin die
A process method, tantalum nitride technology, is applied in the field of surface strengthening treatment of commemorative coin molds, which can solve the problems of low production efficiency and short service life, and achieve the effect of improving production efficiency and prolonging service life
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Embodiment 1
[0014] ① Surface treatment of the mold by nitrogen plasma-based ion implantation. The gas is high-purity nitrogen with a purity of 99.999%, the nitrogen plasma is excited by radio frequency, the injection voltage is 60kV, and the injection dose is 3×10 17 ion / cm 2 ②Heating the above-mentioned surface-treated mold to raise the temperature of the mold to 200°C; ③For the above-mentioned heated mold, deposit a layer of tantalum film with a thickness of 30nm on the surface of the mold by magnetron sputtering; Plasma-based ion implantation treatment to form a tantalum nitride layer, the implantation voltage is 45kV, and the implantation dose is 0.5×10 17 ion / cm 2 ; ⑤ Repeat steps ③ and ④ for a total of 40 times until a tantalum nitride coating with a thickness of 1.2 μm is obtained. The actual silver coin stamping results show that when the number of stamped silver coins reaches 600, the number of flash lines on the silver coin is significantly less than that of silver coins stam...
Embodiment 2
[0016] ① The surface treatment of the mold is carried out by nitrogen plasma-based ion implantation. The gas is high-purity nitrogen gas with a purity of 99.999%, and the nitrogen plasma is excited by radio frequency. The implantation voltage is 60kV and the implantation dose is 5×10 17 ion / cm 2 ②Heating the above-mentioned surface-treated mold to raise the temperature of the mold to 300°C; ③For the above-mentioned heated mold, deposit a layer of tantalum film with a thickness of 100nm on the surface of the mold by magnetron sputtering; ④Take the above-mentioned tantalum film Plasma-based ion implantation treatment to form a tantalum nitride layer, the implantation voltage is 60kV, and the implantation dose is 1×10 17 ion / cm 2 ; ⑤ Repeat steps ③ and ④ for a total of 20 times until a tantalum nitride coating with a thickness of 2 μm is obtained. The actual copper coin imprinting results show that when the hard-plated Cr-plated mold reaches about 2000 pieces, the surface flash...
Embodiment 3
[0018] ① Carry out nitrogen plasma-based ion implantation surface treatment on the mold. The gas is high-purity nitrogen with a purity of 99.999%. The nitrogen plasma is excited by radio frequency. The implantation voltage is 60kV and the implantation dose is 4×10 17 ion / cm 2 ②Heating the above-mentioned surface-treated mold to raise the temperature of the mold to 250°C; ③For the above-mentioned heated mold, deposit a layer of tantalum film with a thickness of 50nm on the surface of the mold by magnetron sputtering; Plasma-based ion implantation treatment to form a tantalum nitride layer, the implantation voltage is 60kV, and the implantation dose is 1×10 17 ion / cm 2 ; ⑤ Repeat steps ③ and ④ for a total of 30 times until a tantalum nitride coating with a thickness of 1.5 μm is obtained. The actual silver coin stamping results show that when the number of stamped silver coins reaches 600, the number of flash lines on the silver coin is significantly less than that of silver c...
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