Low-dust fall vacuum magneto-controlled sputter coating equipment

Abstract

The invention discloses low-dust fall vacuum magneto-controlled sputter coating equipment, which is provided with a sputtering region, wherein a target and an assembly of a magneto-controlled sputtering cathode are arranged in the sputtering region. The low-dust fall vacuum magneto-controlled sputter coating equipment is characterized in that: a shield of the magneto-controlled sputtering cathode is provided with a stainless steel net. During coating of glass with a vacuum magneto-controlled sputter coating method, a cathode shield is provided with the stainless steel net, so that the contact area and adsorption force between ions not sputtered onto a substrate and the cathode shield are increased, the probability of the production of dust fall on coated glass is lowered effectively, the yield of coated products is increased greatly, and the maintenance frequency of the coating equipment is lowered.

Description

technical field [0001] The invention relates to a sputtering coating equipment, which is used in a glass coating process, in particular to a vacuum magnetron sputtering coating equipment with less falling dust. Background technique [0002] At present, the magnetron sputtering equipment used for large-area glass coating on the market adopts a horizontal production line. In this operation, a large number of ions that have not been sputtered to the substrate are adsorbed on the shielding plate or the cathode cover plate, and loose accumulation will be formed for a long time. Some The accumulated "dust" is dispersed in the cavity under the gas fluctuation caused by the process gas, and falls on the surface of the coating substrate under the action of gravity to form dust fall. It is this kind of dust fall that causes a large amount of coating waste. In order to reduce the loss of such waste products, many manufacturers have to perform frequent equipment maintenance, repeatedly ...

AI Technical Summary

Problems solved by technology

[0002] At present, the magnetron sputtering equipment used for large-area glass coating on the market adopts a horizontal production line. In this operation, a large number of ions that have not been sputtered to the substrate are adsorbed on the shielding plate or the cathode cover plate, and loose accumulation will be formed for a long time. Some This kind of accumulated "dust" is dispersed in the chamber under the gas fluctuation caused by the process gas, and falls on the surface of the coating substrate under the action of gravity to cause falling dust. It is this kind of falling dust that causes a large number of coating waste products

In order to reduce this loss of waste products, many manufacturers have to perform frequent equipment maintenance, repeatedly pumping and breaking the vacuum, resulting in a decrease in production efficiency and unstable product quality.

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