Pallet device and crystallized film growth device

Abstract

The invention, belonging to the technical field of crystallized film growth, particularly provides a pallet device for bearing processed substrates. The ballet device comprises a plurality of pallets arranged laminatedly along with a length wise direction, and certain space exists between adjacent pallets. In addition, the invention further provides a crystallized film growth device, comprising a process cavity, a process gas conveying system and an exhaust system, wherein the process cavity is provided with the pallet device for bearing the substrates in the process. The pallet device and the crystallized film growth device having the pallet device can increase the number of the substrates processed by the process at every time with low cost and increase the productivity.

Description

technical field [0001] The invention belongs to the technical field of crystal film growth, and in particular relates to a tray device and crystal film growth equipment using the tray device. Background technique [0002] At present, with the development of technology, chemical vapor deposition (Chemical Vapor Deposition, CVD for short) technology has been applied more and more. In particular, Metal Organic Chemical Vapor Deposition (MOCVD) technology has gradually become the main coating technology in the industry because of its advantages of easy control of coating composition, uniform and dense coating, and good adhesion. The so-called MOCVD technology refers to a chemical vapor phase growth technology that uses metal organic compounds (Metal Organic, referred to as MO) as the source material. to grow the thin film. In the actual process, the equipment that performs the above CVD reaction is called CVD equipment; the equipment that uses MO gas to perform CVD reaction is...

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Problems solved by technology

[0008] Although the structure of the MOCVD equipment disclosed in the above-mentioned Japanese patent documents is relatively simple, in practical applications, because there is only one tray in the process chamber, the production capacity of a single process is relatively small. To place more substrates to increase production capacity, it is necessary to increase the carrying area of ​​the tray (ie, increase the area of ​​the tray)

The increase of the tray area often leads to an increase in the heat loss of the tray, which in turn leads to an increase in the cost of heat preservation and an increase in energy consumption; moreover, the manufacture of large trays requires both large isotropic graphite and more SiC and other coatings, and the volume of the process chamber needs to be increased to accommodate it, which will increase the cost of system manufacturing, operation and maintenance

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