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Plasma processing device used for super-smooth surface

A plasma and processing device technology, applied in the field of plasma processing devices, can solve problems such as polishing surface pollution, and achieve the effects of improving the ionization rate, increasing the number of collisions, and improving processing efficiency

Inactive Publication Date: 2014-04-30
SUZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, because it works in an atmospheric environment, foreign elements will be introduced into the polished surface, causing pollution to the polished surface

Method used

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  • Plasma processing device used for super-smooth surface

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Embodiment Construction

[0024] Please refer to FIG. 1 . FIG. 1 is a schematic structural diagram of a plasma processing device for ultra-smooth surfaces according to the present invention. As shown in the figure, the plasma processing device includes: a vacuum system, an inductively coupled plasma generation system and a water cooling system.

[0025] The vacuum system includes a vacuum chamber 1 and an exhaust unit (not shown in the figure). The vacuum cavity 1 provides a vacuum environment for surface polishing of the price to be processed in the present invention. In order to reduce the contamination of the surface by particles in the air during polishing, the air pressure in the vacuum chamber 1 is required to reach 0.001Pa to 100Pa. Therefore, the designed air extraction unit includes a molecular pump and a mechanical pump. The mechanical pump is used to pre-pump the vacuum chamber 1 first, and then the molecular pump is used for deep pumping until the vacuum chamber reaches the required air pr...

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Abstract

A plasma processing device used for a super-smooth surface comprises a vacuum system, an inductive coupling plasma generating system and a water cooling system. The plasma processing device generates plasmas in a manner of coupling the plasmas inductively, and applies the plasmas on the surface of an object to form a polishing mechanism under a vacuum state. Compared with the prior art, the plasma processing device has the advantages of high processing efficiency and good polishing effect, and can effectively control the uniformity of the plasmas.

Description

technical field [0001] The invention relates to the technical field of non-contact polishing, in particular to a plasma processing device for ultra-smooth surfaces. Background technique [0002] At present, in addition to the traditional polishing technology for flat glass, container glass and art glass, advanced optical manufacturing, substrate production in IT and optoelectronic industries all require ultra-smooth and ultra-precision polishing technology, such as ordinary GenII type flat panel display (FPD) The roughness (Ra) is 20nm, and the surface roughness of optical disk and disk substrate glass is required to be 1-6nm, and the development of modern short-wave optics, strong light optics, electronics and thin film science has more stringent requirements on the surface. Its obvious features are The surface roughness Ra was 1 nm. At present, in the processing of optical parts, the traditional polishing method based on precision grinding is very common, but this method ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C21/00
Inventor 解滨辛煜皱帅
Owner SUZHOU UNIV
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