Chamber component and metal organic compound chemical vapor deposition equipment with same
A chamber and component technology, applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of reducing the efficiency of induction heating, the uniformity of the process, increasing the cost of equipment use, etc. Heating efficiency, easy heating and heat preservation, effect of preventing oxidation
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[0029] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention.
[0030] In the description of the present invention, the orientation or positional relationship indicated by the terms "inner", "outer", "upper", "lower" etc. are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention. There is no requirement that the invention be constructed and operated in a particular orientation, and thus no limitation should be construed.
[0031] Refer below Figure 1-Figure 3 The chamber assembly according to the embodiment of...
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