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Chamber component and metal organic compound chemical vapor deposition equipment with same

A chamber and component technology, applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of reducing the efficiency of induction heating, the uniformity of the process, increasing the cost of equipment use, etc. Heating efficiency, easy heating and heat preservation, effect of preventing oxidation

Active Publication Date: 2012-07-11
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, since the tray is perpendicular to the magnetic force lines, the magnetic force lines will pass through a section of atmosphere (or vacuum) after passing through one layer of trays and before reaching the next layer of trays, which will reduce the efficiency of induction heating and increase the cost of equipment use. It is also not conducive to Creates a uniform temperature distribution inside the tray
Since the MOCVD process requires high temperature uniformity, the above-mentioned shortcomings are likely to affect the uniformity of the process, thereby affecting the quality of the product

Method used

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  • Chamber component and metal organic compound chemical vapor deposition equipment with same
  • Chamber component and metal organic compound chemical vapor deposition equipment with same
  • Chamber component and metal organic compound chemical vapor deposition equipment with same

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Embodiment Construction

[0029] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention.

[0030] In the description of the present invention, the orientation or positional relationship indicated by the terms "inner", "outer", "upper", "lower" etc. are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention. There is no requirement that the invention be constructed and operated in a particular orientation, and thus no limitation should be construed.

[0031] Refer below Figure 1-Figure 3 The chamber assembly according to the embodiment of...

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Abstract

The invention discloses a chamber component which comprises a chamber outer cylinder, an induction coil and a graphite sleeve, wherein an outer cylinder cavity serving as a reaction cavity is limited in the chamber outer cylinder; the induction coil is arranged around the chamber outer cylinder; and the graphite sleeve is sleeved in the outer cylinder cavity of the chamber outer cylinder. According to the chamber component disclosed by the embodiment of the invention, a graphite sleeve is arranged between a pallet and an induction coil and is closer to the induction coil than the pallet, thus the graphite sleeve experiences the induction heating of the induction coil before the pallet and can form a hot wall around the pallet, the pallet can be heated and subjected to heat preservation very easily, and the induction heating efficiency is improved. The invention also discloses metal organic compound chemical vapor deposition equipment with the chamber component.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a chamber component and metal organic compound chemical vapor deposition equipment with the same. Background technique [0002] Metal-organic chemical vapor deposition (MOCVD: Metal-organic Chemical Vapor Deposition) equipment is the key equipment for producing LED epitaxial wafers. The principle of MOCVD equipment is that the organic metal gas enters the reaction chamber, and when it passes through the surface of the high-temperature substrate, a high-temperature chemical reaction occurs, and a film is deposited on the surface of the substrate. By adjusting the process gas and process time, MOCVD equipment can be used to deposit various films on the LED substrate, including the multi-quantum well structure that determines the luminous performance of the LED. In the process of depositing multiple quantum wells, in order to ensure the uniformity of the film, the temperatur...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/46C23C16/44
CPCC23C16/46
Inventor 周卫国
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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