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Synchronous control system of double-cavity excimer laser

An excimer laser, synchronous control technology, applied in general control systems, control/regulation systems, lasers, etc., can solve problems such as affecting normal use and poor synchronization of two-cavity discharges, and achieve the effect of reducing electromagnetic interference and ensuring normal operation.

Active Publication Date: 2013-07-03
ANHUI INST OF OPTICS & FINE MECHANICS - CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a synchronous control system of a dual-cavity excimer laser to solve the problem that the normal use of the dual-cavity excimer laser is affected due to the poor synchronization of the two-cavity discharge in the prior art

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  • Synchronous control system of double-cavity excimer laser
  • Synchronous control system of double-cavity excimer laser
  • Synchronous control system of double-cavity excimer laser

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Embodiment Construction

[0019] Such as figure 1 As shown, the present invention includes a dual-cavity excimer laser body, and also includes a DC power supply, a charging module, a first boost module, a first magnetic switch module, a second boost module, a second magnetic switch module and a synchronous control module. The power supply supplies power to the charging module, and the charging module outputs the electric energy in two ways. One way is boosted by the first booster module and pulse compressed by the first magnetic switch module to discharge and excite the MO cavity of the dual-cavity excimer laser. After boosted by the second booster module and pulse compressed by the second magnetic switch module, the PA cavity of the dual-cavity excimer laser is discharged and excited, and the control terminal of the synchronization control module outputs signals to the first and second booster modules for synchronous control. The signal acquisition end of the module collects the discharge signals...

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Abstract

The invention discloses a synchronous control system of a double-cavity excimer laser. The synchronous control system comprises a direct-current power supply, a charging module, a first boosting module, a second boosting module, a first magnetic switch module, a second magnetic switch module and a synchronous control module, wherein in the synchronous control module, the double cavities of the double-cavity excimer laser are sampled in real time, the sampling information is fed back to a single chip, and a digital programmable delay generator is regulated by the single chip in real time, so that the synchronous control of discharging time intervals (plus or minus 5 ns) of the double cavities is achieved, and the synchronization of the double cavities of the double-cavity excimer laser is effectively realized; in addition, the multiple shield protection is adopted in the synchronous control system of the double-cavity excimer laser, so that the electromagnetic interference caused by the double-cavity excimer laser in the running process is effectively reduced, and the normal running of the system is guaranteed.

Description

technical field [0001] The invention relates to the field of single-chip microcomputer control, in particular to a dual-cavity excimer laser synchronous control system utilizing single-chip microcomputer delay control. Background technique [0002] Excimer lasers can provide high energy, high peak power, and high beam quality laser output in the ultraviolet band. Due to the short wavelength, short pulse width, and high peak power, the output beam can vaporize a variety of metal and non-metal materials during cold processing. , produce neat trimming, no heat-affected zone, excimer lasers are widely used in the field of industrial micro-processing, especially in the field of ultraviolet lithography, and currently have an irreplaceable position. [0003] In recent years, the output power of excimer lasers used in lithography has been increasing, and the specifications of beam parameters such as pulse energy stability, wavelength stability, and bandwidth stability ha...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01S3/102G05B19/042
Inventor 梁勖王效顺鲍健方晓东
Owner ANHUI INST OF OPTICS & FINE MECHANICS - CHINESE ACAD OF SCI