High-Zr content Nb alloy and melt casting manufacturing method thereof

A manufacturing method and content technology, which are applied to the field of high Zr content Nb alloy and its melting and casting manufacturing, can solve the problems of unstable product quality, high production cost, complex production technology process, etc., and achieve low cost, less investment, and avoid serious problems. The effect of segregation

Inactive Publication Date: 2012-09-12
NINGXIA ORIENT TANTALUM IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The existing production technology of Nb alloy with high Zr content is complicated, the production cost is high, and the product quality is unstable

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] Take 100Kg of smelted niobium plate or forged niobium plate purified by electron beam, and 13Kg of zirconium plate. Cut the niobium plate and zirconium plate. The length of the niobium plate is 400mm and the width is 50mm. The niobium plates are bound together with niobium wires as a group, and the assembled materials are smelted for the first time in an electron beam furnace with a melting power of 230kW and a melting speed of 70Kg / h. The ingot after one melting is subjected to electron beam melting again, the melting power is 300kW, and the melting speed is 80kg / h. During the electron beam melting process, the rotation of the bottom ingot and the residence time of the molten pool are kept, so that the alloy is fully fused, diffused and homogenized. And use the electron beam melting secondary ingot as the electrode to carry out arc remelting, and at the same time, use electromagnetic stirring to fully mix the component melt to further homogenize the alloy. The melting a...

Embodiment 2

[0020] Take 100Kg of smelted niobium plate or forged niobium plate purified by electron beam, and 12Kg of zirconium plate. Cut the niobium plate and zirconium plate. The length of the niobium plate is 400mm and the width is 50mm. Between the niobium plates, and use this as a group to bind with niobium wires, the assembled materials are melted for the first time in an electron beam furnace, with a melting power of 230kW and a melting speed of 70Kg / h, and an ingot is melted with an electron beam Arc remelting is carried out for the electrodes, and at the same time, electromagnetic stirring is used to fully mix the component melts to further homogenize the alloy. The melting and casting power is 360kW, thereby obtaining Nb alloy ingots with high Zr content.

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PUM

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Abstract

The invention discloses a high-Zr content Nb alloy and a melt casting manufacturing method thereof. The high-Zr content Nb alloy contains 5 to 12wt% of Zr. The melt casting manufacturing method comprises the following steps of 1, processing an Nb metal into Nb plates, Nb strips or Nb rods, and processing an active Zr metal into Zr rods or Zr plates, 2, mixing the Nb plates, the Nb strips or the Nb rods and the Zr rods or the Zr plates according to a principle of excess of Zr, wherein an excess ratio of Zr is controlled in a range of 15 to 19%, 3, carrying out primary melting of an electrode in an electron beam furnace and carrying out melt casting to obtain a primary alloy ingot, 4, carrying out expanding electron beam melting of the primary alloy ingot, and 5, carrying out arc-melting by the electron beam melted secondary ingot obtained by the step 4 and simultaneously, fully mixing the melt components by electromagnetic stirring to realize alloy homogenization.

Description

technical field [0001] The invention relates to a magnetron sputtering target material, in particular to a Nb alloy with high Zr content and a manufacturing method thereof by melting and casting. Background technique [0002] Nb alloys with higher Zr content are mainly used in the production and processing of magnetron sputtering targets, and as magnetron sputtering targets can be used for vapor phase coating of materials. The basic principle of magnetron sputtering is to apply an orthogonal magnetic field and electric field between the sputtered target (cathode) and anode, and fill the high vacuum chamber with the required inert gas (usually Ar gas), and the permanent magnet A magnetic field of 250-350 Gauss is formed on the surface of the target material, which forms an orthogonal electromagnetic field with the high-voltage electric field. Under the action of the electric field, the Ar gas is ionized into positive ions and electrons, and a certain negative high voltage is...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C22C27/02C22C1/02C22B9/20C22B9/22
Inventor 颉维平白掌军牟东黄全亨聂全新王秋迎
Owner NINGXIA ORIENT TANTALUM IND
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