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Auxiliary device for preparing thin film electrode

An auxiliary device and thin-film electrode technology, which can be used in vacuum evaporation plating, coating, gaseous chemical plating, etc., and can solve problems such as loose contact and uneven thin-film electrodes.

Inactive Publication Date: 2012-10-03
HENAN UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide an auxiliary device for preparing thin film electrodes, which is used to solve the problem that the thin film electrodes prepared are not uniform due to the loose contact between the mask plate and the substrate in the existing thin film electrode preparation process.

Method used

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  • Auxiliary device for preparing thin film electrode
  • Auxiliary device for preparing thin film electrode
  • Auxiliary device for preparing thin film electrode

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Embodiment Construction

[0011] The present invention prepares the embodiment of the auxiliary device of film electrode: as figure 1 , figure 2 As shown, the chassis 1 of the auxiliary device is a circular structure with a certain thickness, and the mask plate 5 and the substrate 6 for preparing thin film electrodes are stacked up and down and placed at the center of the upper end surface of the chassis 1, and the placement mask of the chassis 1 The area of ​​the plate 5 and the substrate 6 is the supporting end surface, the center of the chassis 1 is the center of the supporting end surface, and a pressing mechanism is also installed on the chassis 1 . The pressing mechanism includes four pressing clips 4 and four positioning screws 3. One end of the pressing clip 4 is placed on the chassis 1, and the other end is pressed on the mask plate 5. The four positioning screws 3 are respectively one by one. Correspondingly pass through the four pressing clips 4 and finally thread into the chassis 1. The p...

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Abstract

The invention discloses an auxiliary device for preparing a thin film electrode, which comprises a chassis. The chassis is provided with a supporting end face for supporting a mask plate and a substrate which are overlaid up and down; a pressing mechanism for applying a pressing force for pressing toward the substrate to the mask plate is also arranged on the chassis; and the pressing mechanism comprises a pressure clamp for being pressed on the mask plate and a position control screw which is screwed into the chassis by screw threads after passing downward through the pressing clamp so as to fixedly connect the pressing plate and the chassis. The mask plate can be tightly pressed by the pressing clamp by screwing the position control screw so as to control the pressing degree of the mask plate and the substrate and ensure the mask plate to be sufficiently and tightly contacted with the substrate, thereby avoiding the phenomena of bonding of electrode points and nonuniform thickness of the thin film electrode in the preparation process of the thin film electrode and providing powerful guarantee for preparing the high-quality thin film electrode.

Description

technical field [0001] The invention relates to a preparation process of a thin film electrode, in particular to an auxiliary device capable of adjusting the degree of close contact between a mask plate and a substrate. Background technique [0002] At present, the known thin-film electrode preparation method is to place a mask directly on the substrate, and then obtain the thin-film electrode required for the experiment through a thin-film preparation process. Although this method is simple and easy to implement, because the contact between the mask plate and the substrate is not close, there will be electrode point adhesion and uneven thickness of the film electrode during the growth process of the film electrode. Such results will seriously affect Stability of thin film device performance. Contents of the invention [0003] The object of the present invention is to provide an auxiliary device for preparing thin-film electrodes, which is used to solve the problem of inh...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04C23C16/04
Inventor 孙健张伟风张婷魏凌贾彩虹
Owner HENAN UNIVERSITY
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