Manufacturing method of black matrix, color filter and display device

Abstract

A preparation method of a black matrix used for a color filter and a display device. The preparation method of the black matrix comprises: adding first liquid in photoresist for the black matrix, and performing ultrasonic oscillation, so as to form photoresist emulsion for the black matrix, and multiple liquid drops of the first liquid dispersing in the photoresist emulsion for the black matrix; coating a layer of photoresist emulsion for the black matrix on a substrate; performing first heat treatment on the substrate coated with the photoresist emulsion for the black matrix, so that the multiple liquid drops of the first liquid in the photoresist emulsion for the black matrix are evaporated, so as to form a black matrix thin film layer comprising multiple micro-pores on the substrate; and using a mask template to expose the black matrix thin film layer, and after development and second heat treatment, forming a pattern of the black matrix on the substrate.

Description

technical field [0001] The invention relates to the field of liquid crystal display, in particular to a method for manufacturing a black matrix, a color filter and a display device. Background technique [0002] With the development of Thin Film Transistor Liquid Crystal Display (TFT-LCD) technology, its cost has been reduced and its manufacturing process has been further improved, making it a mainstream technology in the field of flat panel display. TFT-LCD is composed of a color filter and an array substrate. The color filter mainly provides color for TFT-LCD. [0003] The structure of the color filter of the prior art is as figure 1 As shown, it includes: a substrate 1 , and a black matrix 2 , a pixel resin layer 3 , a transparent conductive layer 4 and a columnar spacer 5 sequentially formed on the substrate 1 . The black matrix is ​​made of metal materials such as chrome or black resin materials. When metal materials are used for the black matrix, although the optica...

AI Technical Summary

Problems solved by technology

When metal materials are used for the black matrix, although the optical density ≥ 3 can be achieved with a small film thickness (about 0.1 μm), its reflectivity is high, and the light from the backlight will be reflected to the array substrate, resulting in leakage current , thus affecting the display quality

Although the black matrix of organic resin material has a low reflectivity and avoids the leakage current, if the optical density ≥ 3 is to be achieved, its thickness needs to be 1-2 μm. After the pixel resin layer is formed, the black matrix above the edge Compared with the black matrix using metal materials, the step difference will increase, which will affect the surface flatness of the color filter

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