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Low temperature plasma grafting vaporization method and apparatus

A low-temperature plasma and vaporization device technology, applied in the field of graft vaporization, can solve the problems of easy condensation, inconvenient cleaning, troublesome use, etc., and achieve the effects of keeping the gas path unblocked, easy to clean, and easy to operate.

Inactive Publication Date: 2012-10-24
SUZHOU OPS PLASMA TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Some people use the method of sealing and heating the flask to convert the liquid raw material into steam, and then control the flow of the gas through the shut-off valve. Although this method is simple and feasible, it has disadvantages such as unsuitable control of the vaporization amount, easy condensation, and inconvenient cleaning. Use brings some trouble

Method used

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  • Low temperature plasma grafting vaporization method and apparatus

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Effect test

Embodiment 1

[0029] The liquid raw material is acrylic acid, the heating temperature is 30°C, and the pipe insulation temperature is 35°C.

[0030] Firstly, the output pipe of the vaporization grafting apparatus is connected with the grafting inlet of the low-temperature plasma treatment apparatus. Add 100 ml of acrylic acid into the storage tank, and seal the feeding port; heat the liquid in the storage tank to a constant temperature when it reaches 30°C, and at the same time heat the delivery pipeline to 35°C and keep the temperature constant; After the gas processor reaches the intake stage, adjust the flow meter on the delivery pipeline to adjust the intake flow of the gas to the set value (6 ml / min).

[0031] When cleaning the pipeline, after closing the outlet of the storage tank, heat the delivery pipeline and keep it warm at 35°C. Keep the connection between the output pipeline of the vaporization grafting instrument and the grafting inlet of the low-temperature plasma treatment i...

Embodiment 2

[0033] The liquid raw material is methyl methacrylate, the heating temperature is 25°C, and the pipe insulation temperature is 35°C.

[0034] Firstly, the output pipe of the vaporization grafting apparatus is connected with the grafting inlet of the low-temperature plasma treatment apparatus. Add 100 ml of methyl methacrylate into the storage tank, and seal the feeding port; heat the liquid in the storage tank, and keep the temperature constant when it reaches 30°C; at the same time, heat the delivery pipe to 35°C and keep the temperature constant; After the low-temperature plasma processing apparatus used reaches the intake stage, adjust the flow meter on the delivery pipeline to adjust the intake flow of the gas to the set value (6 ml / min).

[0035] When cleaning the pipeline, close the gas outlet of the storage tank, heat the delivery pipeline, and keep it warm at 35°C. Keep the connection between the output pipeline of the vaporization grafting instrument and the grafting...

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PUM

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Abstract

The invention provides a low temperature plasma grafting vaporization method and its apparatus, the apparatus comprises a material storing can, a heating device, a temperature control apparatus, a cleaning device and a flow regulator. The material storing can is composed of a material storing chamber, a top cover and a sealing ring, the material storing chamber is connected to a top cover by a screw, a feed inlet, a gas outlet and a temperature control probe installation port are provided on the top cover, the feed inlet, the gas outlet and the temperature control probe installing port are connected to the top cover by sealing with an O-shaped sealing ring, The heating device comprises the heating of the material storing can and a conveying pipeline. The invention has the advantages of simple operation, easy vaporization amount control, difficult condensation and easy cleaning, and provides convenience for usage, and the raw material scope is wide.

Description

technical field [0001] The invention relates to a graft vaporization method, in particular to a low-temperature plasma graft vaporizer used in conjunction with a low-temperature plasma surface treatment instrument for vaporizing liquid raw materials and quantitatively transporting them to a reaction chamber. Background technique [0002] Material surface modification technology is one of the commonly used material preparation technologies at present. Its basic principle is that under certain external conditions, the external substances of the material and the surface of the material undergo physical or chemical reactions, so that the state of the material surface changes or the surface of the material changes. Produce new elements and new groups, and finally meet the needs of practical applications. At present, the method of material surface treatment is usually the liquid phase reaction method. Because the liquid phase reaction method has the disadvantages of high energy co...

Claims

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Application Information

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IPC IPC(8): B01J19/00
Inventor 王红卫
Owner SUZHOU OPS PLASMA TECH