Low-radiation heat-treatable coated glass and interlayer glass product thereof
A low-emissivity coating and glass technology, applied in the direction of glass/slag layered products, layered products, metal layered products, etc., can solve the problem that the thermal stability of the film layer and the barrier ability of oxygen atoms are not enough, and the ZnMgO film layer cannot be used as a protection Insufficient sealing effect of dielectric layer and dielectric layer to achieve the effect of increasing visible light transmittance, improving microstructural structure, and reducing non-uniform defects
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Embodiment 1～4
[0049] Explain that when ZnSnMgOx film layer or ZnSnNiOx film layer are arranged on the third dielectric layer in double-silver low-emissivity coated glass, or are arranged on the fourth dielectric layer in three-silver low-emissivity coated glass, relative to ZnSnOx film layer to low-emissivity coating Improved chemical stability.
[0050] Sodium-calcium silicate float green glass with a thickness of 2.1 mm is used as the substrate. After cutting, edging, washing and drying, it enters the magnetron sputtering coating line for coating deposition. The background vacuum is higher than 6×10 -4 Pa. Wherein as shown in table 2, on the glass substrate of comparative example 1 and embodiment 1,2, deposit the double silver film layer listed in table 2 successively; As shown in table 3, in comparative example 2 and embodiment 3,4 The three silver film layers listed in Table 3 were sequentially deposited on the glass substrate.
[0051] As can be seen from Table 2, the difference bet...
Embodiment 5～8
[0062] It shows that the ZnSnMgOx film layer or the ZnSnNiOx film layer is arranged in the double-silver low-emissivity coated glass to improve the thermal stability of the double-silver low-emissivity coating.
[0063] Sodium-calcium silicate float green glass with a thickness of 2.1 mm is used as the substrate. After cutting, edging, washing and drying, it enters the magnetron sputtering coating line for coating deposition. The background vacuum is higher than 6×10 -4 Pa. Wherein, as shown in Table 4, the double silver film layers listed in Table 4 were sequentially deposited on the glass substrates of Comparative Example 3 and Examples 5-8.
[0064] It can be seen from Table 4 that the difference between Examples 5-8 and their corresponding Comparative Example 3 is that the first dielectric layer, the second dielectric layer and the third dielectric layer in Comparative Example 3 are mainly ZnSnOx film layers, and in Example 5 The ZnSnOx film layers of the first dielectri...
Embodiment 9～14
[0072] It shows that the ZnSnMgOx film layer or the ZnSnNiOx film layer arranged in the triple-silver low-emissivity coated glass can improve the thermal stability of the triple-silver low-emissivity coating.
[0073] Sodium-calcium silicate float green glass with a thickness of 2.1 mm is used as the substrate. After cutting, edging, washing and drying, it enters the magnetron sputtering coating line for coating deposition. The background vacuum is higher than 6×10 -4 Pa. Wherein as shown in table 5, on the glass substrate of comparative example 4 and embodiment 9~11 deposit three silver film layers listed in table 5 successively; As shown in table 6, on the glass substrate of embodiment 12~14 The three silver film layers listed in Table 6 were deposited sequentially.
[0074]From Table 5 and Table 6, it can be seen that the difference between Examples 9-14 and their corresponding Comparative Example 4 is that the first, second, third and fourth dielectric layer main bodies ...
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