Circuit structure and manufacturing method thereof
A technology of circuit structure and production method, which is applied in the direction of circuit, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problem of difficult control of etching rate, accelerated circuit layer etching or dissolution rate, and the thickness of circuit layer copper or copper alloy cannot meet the demand And other problems, to achieve the effect of good electrical quality
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[0048] Figure 1A to Figure 1C A cross-sectional view illustrating a manufacturing method of a circuit structure according to an embodiment of the present invention. Please refer to Figure 1A According to the manufacturing method of the circuit structure of this embodiment, firstly, an insulating layer 110 and a metal layer 120 are provided, wherein the metal layer 120 has an upper surface 122 and a lower surface 124 opposite to the upper surface 122, and the insulating layer 110 It is disposed on the lower surface 124 of the metal layer 120 for supporting the metal layer 120 . In this embodiment, the material of the metal layer 120 is, for example, copper or copper alloy.
[0049] Next, please refer to Figure 1B, forming a surface protection layer 130a on the metal layer 120, wherein the surface protection layer 130a exposes part of the upper surface 122 of the metal layer 120, and the material of the metal layer 120 is different from that of the surface protection layer ...
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