Polysilicon purification ingot furnace vacuum set
A technology of vacuum unit and ingot casting furnace, which is applied in the growth of polycrystalline materials, inorganic chemistry, crystal growth, etc., and can solve the problems of inability to achieve the purpose of vacuum dephosphorization and insufficient ultimate vacuum
Inactive Publication Date: 2012-11-21
WUJIANG YATAI VACUUM EQUIP TECH
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[0003] In order to solve the problem that the ultimate vacuum degree of ordinary existing vacuum units is not enough to achieve the purpose of vacuum phosphorus removal, the present invention provides the following technical solutions:
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[0009] The preferred embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings, so that the advantages and features of the present invention can be more easily understood by those skilled in the art, so as to make a clearer and clearer definition of the protection scope of the present invention.
[0010] As attached figure 1 As shown, a polysilicon purification ingot furnace vacuum unit includes 4 H-150 slide valve pumps, 2 ZJB-600 Roots pumps, 2 ZJB-2500 Roots pumps, and 1 K-1200 diffusion pump. The two ZJB-600 Roots pumps and the two ZJB-2500 Roots pumps described are divided into two groups. One ZJB-600 Roots pump and one ZJB-2500 Roots pump are connected in series, and the front stage is ZJB -2500 Roots pump, the subsequent stage is ZJB-600 Roots pump, which is connected in series to form two groups; of which two H-150 spool valve pumps are connected in parallel, and then 1 ZJB-600 Roots pump and 1 ZJB-1200 Roots pump...
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The invention provides a polysilicon purification ingot furnace vacuum set. The polysilicon purification ingot furnace vacuum set comprises four H-150 slide valve pumps, two ZJB-600 roots pumps, two ZJB-2500 roots pumps, and a K-1200 diffusion pump, wherein the two ZJB-600 roots pumps and the two ZJB-2500 roots pumps are divided into two groups; one ZJB-600 roots pump is in series with one ZJB-2500 roots pump, the primary pumps are the ZJB-2500 roots pumps, the secondary pumps are the ZJB-600 roots pumps, and the two series groups are formed; and the two H-150 slide valve pumps which are in parallel with each other are in series with the two groups of the two-stage vacuumizers which are in series with each other before, and the two groups of the two-stage vacuumizers are in parallel with the K-1200 diffusion pump. The polysilicon purification ingot furnace vacuum set enables the cold ultimate vacuum to reach 6.7*10<-4>Pa, and effectively overcomes a problem that the diffusion pump cannot be started because of the volatilization of high-temperature silicon vapor.
Description
Technical field [0001] The invention relates to the field of solar equipment manufacturing, in particular to a vacuum unit of a polysilicon purification ingot furnace. Background technique [0002] The polysilicon purification ingot furnace is the main equipment for the physical manufacturing of polysilicon materials, and it is also the key equipment for phosphorus removal in the polysilicon purification process. High temperature and high vacuum is the key process for phosphorus removal. Because the heating temperature during the phosphorus removal process needs to reach about 1600°C, Therefore, a large amount of silicon vapor and other volatiles evaporate instantly, which requires a high-speed vacuum unit to extract these impurities and maintain the vacuum at a very high state. The current vacuum unit generally uses the conventional vacuum three-stage vacuum pumping system, that is, the selection pump, the roots pump, and the diffusion pump. Due to the high instantaneous volatil...
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Login to View More IPC IPC(8): C01B33/037C30B11/00C30B28/06C30B29/06
Inventor 李荣华
Owner WUJIANG YATAI VACUUM EQUIP TECH