Conductive sliding film, member formed from conductive sliding film, and method for producing same

A technology of conductivity and components, which is applied in the direction of conductive materials dispersed in non-conductive inorganic materials, optical components, camera bodies, etc., can solve problems such as low reflectivity, development, and inability to ensure appearance quality, and achieve wear resistance High performance and good sliding properties

Active Publication Date: 2013-01-16
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] It is assumed that if a material such as a hard but low-reflectance metal compound is used instead of metal chrome, the desired appearance quality cannot be ensured
In addition, if a soft metal with high reflectivity is used, scra

Method used

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  • Conductive sliding film, member formed from conductive sliding film, and method for producing same
  • Conductive sliding film, member formed from conductive sliding film, and method for producing same
  • Conductive sliding film, member formed from conductive sliding film, and method for producing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～8

[0065] will use image 3 Examples of forming a conductive sliding film using the shown FCVA film forming apparatus 1 are shown below. In this example, a sintered graphite target containing Ti 2.15 [at%] was used as the target 11 containing metal elements, and a ta-C:Ti film (titanium-doped tetrahedral amorphous carbon film) was formed on the surface of the substrate. It should be noted that, as the sintered graphite target, a dehydrated graphite target was used. As will be described later, in order to separately evaluate the sheet resistivity, hardness, elastic modulus, film composition, friction coefficient, and wear resistance of the ta-C:Ti film, different substrates were used. The ta-C:Ti film was formed several times under different conditions. Specifically, in order to measure the sheet resistivity, the substrate used SiO 2 As for the glass substrate, a brass camera mounting part was used for evaluation of abrasion resistance, and a Si substrate was used for other cas...

Embodiment 9

[0070] Using a sintered graphite target containing Ti 2.15 [at%] that has not been dehydrated as the target 11 containing metal elements, the operating conditions of the FCVA film formation device 1 were changed to Figure 7 Except for the values ​​shown, a film was formed in the same manner as in Example 1. A film with a film thickness of 365 [nm] was formed on the substrate at a film forming rate of 0.12 [nm / s].

[0071] The obtained film was analyzed for components constituting the film by the Rutherford backscattering method in the same manner as in Example 1. show the result in Figure 7 in the table. It should be noted that hydrogen could not be measured in the experiment for the film obtained in this example. In addition, the chemical composition in the depth direction of the film obtained in this example is shown in Figure 9 . exist Figure 9 In the coordinate diagram of , the horizontal axis is the depth from the film surface to the film thickness direction, an...

Embodiment 10～14

[0102] Set the operating condition of the FCVA unit to Figure 11 A ta-C:Ti film having a different Ti / C atomic ratio was formed in the same manner as in Example 1 except for the values ​​shown in the table of . The Ti / C atomic ratio of the obtained film is shown in Figure 11 table. It should be noted that the atomic ratio (at %) in the Ti film was also recorded together. In addition, the volume resistivity, hardness, and dynamic friction coefficient of the obtained ta-C:Ti film were measured in the same manner as in Examples 1 to 9, and the results are shown in Figure 11 table. It should be noted that, as a reference, the physical properties of the films obtained in Examples 6 and 9 are also shown in Figure 11 in the table.

[0103] Loading and unloading durability test (evaluation of abrasion resistance)

[0104] Next, the performance of the sliding film as the mount of the camera was evaluated as follows. With the operating conditions of the FCVA devices in Exampl...

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Abstract

Disclosed is a conductive sliding film (50), which is a film applied to the surface of a relatively sliding member (60). The conductive sliding film (50) is a metal-doped tetrahedral amorphous carbon that is doped with a metal element and has resistivity in a range of 10<2>-10<-4> [Omega cm] and surface hardness in a range of 10-30 [GPa]. The conductive sliding film is provided with high abrasion resistance and excellent slidability and is suitable for mounting members for cameras.

Description

technical field [0001] The present invention relates to a conductive sliding film that can be formed on the surface of a relatively slidable member, a member such as a mounting member for a camera on which the conductive sliding film is formed, and a method for producing the conductive sliding film. Background technique [0002] Plating is often formed on the surface of a member that slides relatively or a member that is relatively slidably connected to a mated surface of another member (referred to as a connecting member). As an example of such a member, an exterior member such as an optical device can be exemplified, and as a connecting member, an example can be exemplified. In a camera system in which the lens unit is detachably replaceable with respect to the camera body, what is provided on the body side and the lens side is called A connecting part of a bayonet mount (hereinafter, simply referred to as "mount"). The mount is generally configured in such a way that the...

Claims

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Application Information

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IPC IPC(8): C23C14/06G02B7/02G03B17/14
CPCC23C14/0605G02B7/02G03B17/14H01B1/24C23C14/325H01B1/22C23C14/548C03C17/22C03C2217/29Y10T428/24025
Inventor 泷优介
Owner NIKON CORP
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