Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Polysilicon reduction apparatus

A polysilicon and reduction furnace technology, applied in the direction of silicon, sustainable manufacturing/processing, climate sustainability, etc., can solve the problems of huge energy consumption, high cost of polysilicon reduction furnace, low output, etc., to reduce investment and save energy Consumption and operating costs, the effect of improving yield

Inactive Publication Date: 2013-01-30
王春龙
View PDF3 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In order to overcome the problems of high cost, huge energy consumption and low output of polysilicon reduction furnaces used in the industry, the present invention provides a polysilicon reduction device to achieve the purpose of reducing production costs, reducing energy consumption and improving production efficiency

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Polysilicon reduction apparatus
  • Polysilicon reduction apparatus

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] Example 1, such as figure 2 As shown, a polysilicon reduction device for producing polysilicon that the present invention relates to includes 10 polysilicon reduction furnaces 1, and the polysilicon reduction furnaces 1 are connected in parallel and then connected in series in four stages. The polysilicon of each stage of the polysilicon reduction device The number of reduction furnaces 1 is reduced step by step, that is, four polysilicon reduction furnaces 1 are connected in parallel in the first stage, three polysilicon reduction furnaces 1 are connected in parallel in the second stage, and two polysilicon reduction furnaces 1 are connected in parallel in the third stage. Furnace 1, the fourth stage is one polysilicon reduction furnace 1, and the gas outlets 14 of the four polysilicon reduction furnaces 1 in the first stage are combined with the three polysilicon reduction furnaces in the second stage respectively The gas inlet 15 of 1 is connected, and the gas outle...

Embodiment 2

[0020] Example 2, the rest is the same as in Example 1, the difference is that the polysilicon reduction device has 4 levels, the first level is connected in parallel with 6 polysilicon reduction furnaces 1, and the second level is connected with 4 polysilicon reduction furnaces 1 in parallel. Furnace 1, two polysilicon reduction furnaces 1 are connected in parallel in the third stage, and one polysilicon reduction furnace 1 is connected in the fourth stage.

[0021] In the above embodiments, the number of stages of the polysilicon reduction furnace 1 can be 2, 3 or 5, which is determined according to actual needs. The number of polysilicon reduction furnaces 1 at each stage can also be determined arbitrarily as required, as long as the number can be reduced step by step.

[0022] The beneficial effects of the present invention are: 1. Heat exchange device and condensing device are omitted, or the quantity or power of heat exchange device, condensing device and exhaust gas sep...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A polysilicon reduction apparatus comprises at least two polysilicon reduction furnaces, wherein the polysilicon reduction furnaces are connected in multistage series, or are connected in parallel and then in multistage series, the minimum number of the multistage is two, and each stage is provided with at least one of the polysilicon reduction furnaces. The polysilicon reduction apparatus has the beneficial effects of omission of a heat exchange device and a condensation device or substantial reduction of the number or the power of the heat exchange device, the condensation device and a tail gas separation, refrigeration and recovery device, great reduction of the fixed asset investment and the land occupation, and saving of the energy consumption and running cost of the above devices, full heat energy utilization, energy saving, environmental protection, substantial reduction of the tail gas amount, full raw material reaction, yield improvement, and productivity improvement.

Description

technical field [0001] The invention relates to a production equipment of polysilicon, in particular to a polysilicon reduction device for producing polysilicon. Background technique [0002] With the development of science and technology, the development of solar photovoltaic industry and semiconductor industry is becoming more and more rapid. As the main raw material of solar photovoltaic industry and semiconductor industry, polysilicon has an increasing industrial demand. [0003] At present, there are many methods for producing polysilicon in the industry, among which the hydrogen reduction method is more common. It uses purified trichlorosilane and purified hydrogen as raw materials, and passes them into the reaction vessel. Under high temperature and pressurized environment, the two react chemically in the reaction vessel to form polysilicon, which is deposited in the reaction vessel. on the heating element in the container. As the chemical reaction continues, more ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/03
CPCY02P20/10
Inventor 王春龙
Owner 王春龙
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com