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How to set the judgment value of heat treatment plate

A technology for setting methods and judging values, which is applied to instruments, adaptive control, control/regulation systems, etc., can solve the problems of complex equipment structure, high error rate, inconvenient operation, etc., achieve high calculation accuracy, save man-hours, and operate easy effect

Active Publication Date: 2017-05-24
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The present invention aims at the defects in the prior art that the traditional method for setting judgment values ​​of heat treatment plates requires special professional software, and related data acquisition equipment has complex structure, inconvenient operation, high error rate and other defects, and provides a heat treatment plate How to set the judgment value

Method used

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  • How to set the judgment value of heat treatment plate
  • How to set the judgment value of heat treatment plate
  • How to set the judgment value of heat treatment plate

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Embodiment Construction

[0025] In order to illustrate the technical content, structural features, achieved goals and effects of the present invention in detail, the following will be described in detail in conjunction with the embodiments and accompanying drawings.

[0026] see figure 1 , figure 2 , figure 1 Shown is a flow chart of the method for setting the judgment value of the heat treatment plate in the present invention. figure 2 Shown is the judgment value obtained by the method of setting the judgment value of the heat treatment plate according to the present invention. The method for setting the judgment value of the heat treatment plate comprises the following steps:

[0027] Executing step S1: setting a first judgment value, the first judgment value being higher than the temperature integral value under the normal state;

[0028] Execute step S2: run n 1 a virtual wafer, and trigger the alarm of the temperature control detection system (not shown), and then obtain the temperature ...

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Abstract

The invention discloses a method for setting a heat treatment plate judgment value. The method comprises the following steps of: 1, setting a first judgment value; 2, operating n1 virtual wafers, and triggering a temperature control detection system to alarm to obtain temperature integral values under the normal state, wherein the average value of different integral values under the normal state is recorded, and the standard difference of the different temperature integral values under the normal state is recorded as delta 1; 3, setting a second judgment value; 4, operating n2 virtual wafers, and triggering a temperature control detection system to alarm to obtain temperature integral values under the abnormal state, wherein the average value of different temperature integral values under the abnormal state is recorded, and the standard difference of the different temperature integral values under the abnormal state is recorded as delta 2; and 5, calculating the heat treatment plate judgment value. By the method for setting the heat treatment plate judgment value, the judgment values are easy and convenient to set, working hours are saved, the calculation accuracy is high, errors are small, and the method is easy to popularize.

Description

technical field [0001] The invention relates to the technical field of semiconductor equipment, in particular to a method for setting a judgment value of a heat treatment plate for integrated circuit wafer baking. Background technique [0002] As the integration level of integrated circuits continues to increase, semiconductor technology continues to develop rapidly. With the continuous improvement of semiconductor performance requirements, the size of integrated circuit chips is getting smaller and smaller, and the photolithography process has gradually become the core process in chip manufacturing. Usually, in a complete chip manufacturing process, multiple photolithography processes are required. For example, in a complete 45nm process chip manufacturing process, about 40 to 60 photolithography processes are required depending on the performance requirements; As the size shrinks, the pattern of lithography will also shrink accordingly, and the thickness of photoresist an...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G05B13/04
Inventor 虞良凌意明韩玉龙王世辉
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP